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Probe apparatus of radio frequency plasma

A radio frequency plasma and plasma technology, applied in the field of plasma science, can solve the problems of radio frequency and dual frequency plasma diagnosis, and achieve high spatial resolution and small probe size

Inactive Publication Date: 2009-01-28
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a radio frequency plasma probe device to solve the problem that radio frequency and dual frequency plasma cannot be diagnosed due to the interference of radio frequency signals

Method used

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  • Probe apparatus of radio frequency plasma
  • Probe apparatus of radio frequency plasma
  • Probe apparatus of radio frequency plasma

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Embodiment Construction

[0017] Specific embodiments of the present invention will be described in detail below in conjunction with technical solutions and accompanying drawings.

[0018] exist figure 1 Among them, the double probe consists of two tungsten wires parallel to each other with a distance of 1 mm, and each tungsten wire has a diameter of 0.2 mm and a length of 4 mm. The 5V voltage output by the USB interface of the notebook computer is transformed into plus or minus 100V by a direct-current (DC-DC) module and provided to the amplifying drive circuit as a power supply. The amplifying drive circuit is an inverting input amplifier using PA08 high voltage op amp. The analog-to-digital / digital-to-analog conversion card uses the USB-6211 data acquisition card with analog output function of NationalInstruments Company. The notebook computer controls the analog-to-digital / digital-to-analog conversion card to output the scanning bias signal in the range of 0~±10V, which is amplified by the amplif...

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PUM

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Abstract

The invention relates to a radio frequency plasma probe unit used for diagnosing the plasma, belonging to the field of plasma science and technology. The radio frequency plasma probe unit is characterized in that the radio frequency plasma probe unit consists of dual probes, an amplification driving circuit, an AD / DA conversion card and a notebook; besides the dual probes arranged in the plasma, other components of the probe unit are arranged far away from a plasma discharging system ground; the operation of the probe unit completely depends on the power supply of the battery of the notebook computer in the device. The radio frequency plasma probe unit of the invention has the effects and benefits that the radio frequency plasma probe unit is not disturbed by the radio frequency signals, can diagnose the single radio frequency discharging plasma and the dual-frequency discharging plasma and requires no radio frequency chokes and auxiliary electrodes; the probe has small dimension, can diagnose the plasma with short clearance and small space discharging and has high space resolution; the analog output of the AD / DA conversion card replaces an oscillation circuit or integral circuit to generate a scanning bias signal, thus being convenient for smartly controlling the waveform, extent and frequency of the scanning bias signal according to the requirement.

Description

technical field [0001] The invention belongs to the field of plasma science and technology, and relates to a radio-frequency plasma probe device for diagnosing plasma, especially radio-frequency and dual-frequency plasma to obtain parameters such as plasma density and electron temperature. Background technique [0002] Probes are commonly used devices for diagnosing plasma parameters, and can be divided into single-probe, double-probe and other types. The single probe is to place a small metal electrode in the plasma, apply a scanning bias voltage between the probe and the plasma ground, and then measure the change of the probe current with the scanning bias voltage to obtain the volt-ampere characteristic curve. Then by analyzing the volt-ampere characteristic curve, the parameters of the plasma can be obtained. The double probe is composed of two close single probes, and the scanning bias voltage is added between the two probes to obtain the plasma parameters by analyzing...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01R1/073
Inventor 陆文琪王友年邓新绿徐军董闯
Owner DALIAN UNIV OF TECH