Method for preparing small separation distance electrode on transmission electric mirror sample
A transmission electron microscope sample and transmission electron microscope technology, applied in the direction of measuring electricity, measuring devices, measuring electrical variables, etc., to achieve reliable performance, expanded functions, and simple structure
Inactive Publication Date: 2011-05-11
BEIJING UNIV OF TECH
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Problems solved by technology
At present, the main methods for in-situ testing of the electrical properties of nanoscale micro-units are: 1. Based on the focused ion beam FIB (focus iron beem) technology, electrodes are deposited on both ends of the object to be tested for measurement. Can be implemented, but difficult to measure due to sample destruction due to tip pressure
2. Use the atomic force microscope to directly use the needle tip as an electrode to contact the unit under test and apply voltage to measure. The advantage is that the measurement is accurate, but the disadvantage is that the in-situ real-time observation ability is poor, and the sample in the plane of the sample stage cannot be measured
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[0021] The specific steps of the method for preparing small-pitch electrodes on a transmission electron microscope sample are as follows:
[0022] The easy-to-process copper, nickel, gold sheets, etc. are made into a metal mesh structure, and the hollow part is etched and removed by photolithography mask method. The line width between the grids does not exceed 1 μm, and the grid diameter is about 0.2mm. The thickness is about 0.2mm, and the mask is flat.
[0023] A 20nm SiO2 film is deposited by magnetron sputtering on the carbon support film copper, nickel, and gold grid, and finally the sample film to be tested is deposited or nanowires are spread on it.
[0024] Put the mask on the surface of the sample, and stick it tightly, and use a coating machine to coat a layer of 100nm metal Pt film. Remove the mask to get as figure 1 The neatly arranged electrode array is shown, and the gap between the arrays is the film to be tested that is not coated with electrodes.
[0025] ...
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The invention discloses a method used for preparing electrodes with small spacing on a transmission electron microscope, comprising three steps of: shielding plate preparation process, an electrode reparation step and an electric measuring step; in the shielding plate preparation process, a metal plate is prepared as a metal net-shaped structure; the shielding plate is photo-etched so as to corrode and remove the hollow part, thus obtaining the finished shielding plate; in the electric measuring step, in-situ electric measurement is carried out by using two probes to touch and press two adjacent electrodes or using conductive adhesive to attach the conductive wire specially used by transmission electron microscope film electrifying sample rod to two adjacent electrodes; in the electrode preparation process, a net-shaped mask film method is used to prepare a plurality of electrodes on the transmission electron telescope sample; and the spacing of the electrodes is less than 1 Mu meter.The method of the invention provides a novel in-situ electric test method for nanometer wire or film, has the advantages of reliable performance, convenient installation and simple structure, enlarges the function of the transmission electron telescope, and can realize the electric measurement of the same sample for a plurality of times, with each measurement being independent.
Description
technical field [0001] The invention relates to a method for preparing small-pitch electrodes on a transmission electron microscope sample and for electrical measurement. Specifically, a mask method is used to prepare metal electrodes with an electrode spacing of less than 1 μm on an ultra-thin transmission electron microscope sample. The invention belongs to the field of in-situ measurement of properties of nanometer materials. Background technique [0002] With the development of nanotechnology and the development of nanodevices, the electrical properties and electric field effects of nanowire or thin film materials under the action of external fields, especially electric fields, have become the focus of research. Response and service behavior, and accumulating data on their electrical properties, are fundamental goals in the current design and development of nanodevices. At present, the main methods for in-situ testing of the electrical properties of nanoscale micro-uni...
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IPC IPC(8): G01R31/00
Inventor 张泽王珂成岩韩晓东
Owner BEIJING UNIV OF TECH