Manufacturing method for low voltage diode with large capacitance variant ratio
A diode and variable capacitance technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of large series resistance, many process steps, and small variable capacitance ratio, and achieve large capacitance change ratio and few process steps , Improve the effect of variable capacity ratio
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[0024] The present invention will be described in further detail below in conjunction with specific examples and accompanying drawings.
[0025] (1) At a resistivity of 0.001Ω·cm, N heavily doped with arsenic ++ On the silicon substrate 1, an N-type epitaxial layer 2 is grown by a conventional method. The thickness of the N-type epitaxial layer 2 is 2.5 μm, the resistivity is 2.5Ω·cm, and the impurity is phosphorus, forming the low-voltage large The N of the varactor diode ++ / N - 1 area, as shown in Figure 1.
[0026] (2) Perform conventional oxidation on the silicon substrate 1 on which the N-type epitaxial layer has been grown, grow an oxide layer 3, the thickness of the oxide layer is 1.2 μm, conventional photolithography, etch out the active region The window has an area of 220 μm×220 μm, and the surface of the N-type epitaxial layer 2 on the silicon substrate is exposed in the window of the active region, as shown in FIG. 2 .
[0027] (3) Carry out conventional o...
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