Alkali etch solution and method for preparing monocrystalline silicon pile fabrics

A technology of alkali corrosion and alkali solution, which is applied in the fields of final product manufacturing, sustainable manufacturing/processing, photovoltaic power generation, etc., can solve the problem of changing the frequency of solution, increasing the rework rate of suede preparation, affecting the conversion efficiency of solar cells, and increasing the fragmentation of cells Incidence rate and other issues, to achieve the effect of stable texturing process, wide control range and low manufacturing cost

A technology of alkali corrosion and alkali solution, which is applied in the fields of final product manufacturing, sustainable manufacturing/processing, photovoltaic power generation, etc., can solve the problem of changing the frequency of solution, increasing the rework rate of suede preparation, affecting the conversion efficiency of solar cells, and increasing the fragmentation of cells Incidence rate and other issues, to achieve the effect of stable texturing process, wide control range and low manufacturing cost

CN101423942AInactive Publication Date: 2009-05-06蒋冬 +1
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  • Alkali etch solution and method for preparing monocrystalline silicon pile fabrics
  • Alkali etch solution and method for preparing monocrystalline silicon pile fabrics
  • Alkali etch solution and method for preparing monocrystalline silicon pile fabrics

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] The percentage by weight of NaOH solution is 2% in the present embodiment, and the percentage by weight of Virahol is 6%, and NaOH solution 2 SiO 3 The weight percentage is 0.5%, Pb(NO 3 ) 2 The weight percentage is 0.05‰. The temperature of the alkali etching solution is 80° C., the alkali etching time of the monocrystalline silicon wafer is 20 minutes, and the measured result of the size of the prepared textured pyramid is 0.9 μm.

Embodiment 2

[0027] The percentage by weight of NaOH solution is 3% in the present embodiment, and the percentage by weight of Virahol is 5%, and NaOH solution 2 SiO 3 The weight percentage is 1%, Pb(NO 3 ) 2 The weight percentage is 0.02‰. The temperature of the alkali etching solution is 85° C., the alkali etching time of the monocrystalline silicon wafer is 28 minutes, and the measured result of the size of the prepared textured pyramid is 1.5 μm.

Embodiment 3

[0029] The percentage by weight of NaOH solution is 1.5% in the present embodiment, and the percentage by weight of Virahol is 7%, and NaOH solution 2 SiO 3 The weight percentage is 0.2%, Pb(NO 3 ) 2 The weight percentage is 0.1‰. The temperature of the alkali etching solution is 82° C., the alkali etching time of the monocrystalline silicon wafer is 25 minutes, and the measured size of the prepared textured pyramid is 0.7 μm.

[0030] In the above examples, NaOH solution can be replaced by the same amount of KOH solution, Pb(NO 3 ) 2 It can be replaced by the same amount of Pb.

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Abstract

The invention belongs to the field of monocrystalline silicon solar battery production and discloses an alkaline corrosion solution and a method for preparing monocrystalline silicon texture. The solution is a mixed liquor of an alkaline solution, isopropanol and Na2SiO3, and is structurally characterized in containing 0.002 to 0.01 weight percent of Pb(NO3)2 or Pb. The weigh percentage of the alkaline solution is 1 to 3.5 percent, the weight percentage of the isopropanol is 5 to 7 percent, and the weight percentage of Na2SiO3 is 0.2 to 2 percent. The method is to soak a monocrystalline silicon piece in the alkaline solution to perform a corrosion reaction for 20 to 30 minutes under a condition that the alkaline corrosion solution is at a temperature of between 75 and 80 DEG C. The alkaline corrosion solution and the method have the advantages of reducing surface reflectivity of the monocrystalline silicon piece, preparing a fine texturing 'pyramid', along with low cost, simple operation and stable and effective preparation of the monocrystalline silicon texture.

Description

technical field [0001] The invention belongs to the field of manufacturing monocrystalline silicon solar cells, and relates to an alkali etching solution and method for preparing monocrystalline silicon textured surfaces. Background technique [0002] Since the advent of solar cells, the entire market is still dominated by monocrystalline silicon solar cells so far. Improving the stability of the preparation of the textured surface of monocrystalline silicon wafers and preparing the pyramids of the textured surface of monocrystalline silicon wafers into nanoscale has always been the focus of technical personnel in this field. One of the goals to strive for. Improving the stability of the monocrystalline silicon textured surface preparation can reduce the frequency of solution preparation and greatly improve production efficiency; reducing the volume of the monocrystalline silicon textured pyramid can eliminate many hidden dangers in the solar cell production process. Theref...

Claims

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Application Information

Patent Timeline
06 May 2009
Publication
CN101423942A
IPC
C23F1/40
CPC
Y02E10/50; Y02P70/50
Inventors
蒋冬; 方为仁