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Multichannel amorphous silicon solar energy plate laser film-engraving machine

A technology of solar panels and solar panels, applied to lasers, nonlinear optics, laser welding equipment, etc., to achieve the effects of shortening processing time, saving investment, and simple structure

Inactive Publication Date: 2011-05-25
WUHAN LINGYUN PHOTOELECTRONICS SYST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If you want to further increase the scribing speed and improve production efficiency, there is already a limit to simply increasing the frequency of acousto-optic Q-switching

Method used

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  • Multichannel amorphous silicon solar energy plate laser film-engraving machine
  • Multichannel amorphous silicon solar energy plate laser film-engraving machine
  • Multichannel amorphous silicon solar energy plate laser film-engraving machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0019] Implementation mode 1: if figure 1 As shown, a multi-channel amorphous silicon solar panel laser engraving machine adopts semiconductor-pumped YAG solid-state laser module 1, the laser power of this module is 50W, the laser wavelength is 1064nm, and the size of the YAG laser rod in the module is φ3-4 ×60-80mm, together with the 1064nm total reflection mirror A2, the 1064nm high reflection mirror 3, and the acousto-optic Q-switch 4 form a fundamental frequency 1064nm pulsed laser oscillation. The fundamental frequency laser is frequency-doubled by KTP crystal 5 (size 7×7×(7-12) mm, θ=90 degrees, φ=23.5-24.2 degrees) to generate frequency-doubled 532nm laser 6, 1064nm high reflection mirror 3 can transmit 532nm laser 6 at the same time. The frequency doubled laser light 6 is output from the high reflection mirror 3 .

[0020] The frequency-doubled laser beam 6 passes through a beam expander 7 (beam expansion ratio is 3-5) for beam expansion and collimation, and then pa...

Embodiment approach 2

[0023] Implementation mode 2: if figure 2 As shown, the 4 laser beams 6c, 6d, 6e and 6f formed by the beam splitter B9 and the beam splitter C11 can also be coupled to the energy of 100-400 microns through the four coupling focusing systems A19, B20, C21 and D22 Among the optical fibers, after being transmitted by optical fibers A23, B24, C25, and D26, they reach four focusing lenses A14, B15, C16, and D17, which can also complete the task of multi-channel simultaneous processing.

[0024] The focal spot diameter of the multi-head laser output is 0.1mm, which can complete the scribing process of the conductive film of the solar cell and the photovoltaic layer, and the sum of the "three lines and two intervals" does not exceed 0.5mm.

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Abstract

The invention relates to a laser film engraving machine for a multichannel amorphous silicon solar panel, which comprises a laser module, a total reflective mirror, a beam splitter, a high reflective mirror, a beam expanding mirror, a driving Q-switching switch, a frequency doubling crystal, a focusing mirror and an X-Y mechanical platform. The laser film engraving machine for the multichannel amorphous silicon solar panel is characterized in that frequency doubling laser generated by the laser module, the total reflective mirror, the high reflective mirror, the driving Q-switching switch andthe frequency doubling crystal is subjected to beam expanding and collimation of the beam expanding mirror, passes through the beam splitter, and is subjected to multiple reflection or transmission of the total reflective mirror and focusing of the focusing mirror to form four paths of frequency doubling laser, and the four paths of frequency doubling laser are attached to the mechanical platformand move in the X axial direction or the Y axial direction, so that simultaneous processing of a solar panel in multiple paths can be realized. The laser film engraving machine for the multichannel amorphous silicon solar panel has novel concept, reasonable design and standard technology, can meet the processing requirements of solar panels with different specifications, has the characteristics of low processing cost, small floor space of equipment, and so on can quickly form industrial mass production, and can be widely applied to the engraving technology of bottom electrodes, photovoltaic effect layers and surface ohmic contact electrode layers in the technological flow of thin-film solar cells.

Description

technical field [0001] The invention relates to a laser engraving machine for an amorphous silicon solar panel, in particular to a multi-channel laser engraving machine for an amorphous silicon solar panel. Background technique [0002] The production process of amorphous silicon solar cells involves the thin film deposition of the bottom electrode, the intermediate photovoltaic effect layer and the surface ohmic contact electrode layer and the scribing of each layer. Compared with the traditional mask method, laser scribing technology has higher production efficiency and stable product quality, and has been well applied in the manufacturing process of solar cells. [0003] The current solar cell laser scribing process uses a single laser head and a single optical path for processing. The scribing speed has increased from the initial 0.5 m / s to the current 2.5 m / s. Calculated according to the spot diameter of 0.05mm, assuming that the laser If the overlap rate between the l...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B23K26/067B23K26/36B23K26/40H01S3/109H01L31/20G02F1/35B23K26/362
CPCY02P70/50
Inventor 王锋夏文建
Owner WUHAN LINGYUN PHOTOELECTRONICS SYST
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