Unlock instant, AI-driven research and patent intelligence for your innovation.

Optical multilayer filter, method of manufacturing the same, and electronic apparatus

An optical multilayer film and manufacturing method technology, applied in optics, optical elements, coatings, etc., can solve problems such as adverse effects of optical characteristics, achieve the effects of improving adhesion, inhibiting adhesion, and reducing surface energy

Active Publication Date: 2009-05-20
SEIKO EPSON CORP
View PDF1 Cites 20 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the surface of the optical multilayer film filter tends to attract dust, which may adversely affect the optical characteristics of electronic equipment incorporating the optical multilayer film filter.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optical multilayer filter, method of manufacturing the same, and electronic apparatus
  • Optical multilayer filter, method of manufacturing the same, and electronic apparatus
  • Optical multilayer filter, method of manufacturing the same, and electronic apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0048] Embodiments embodying the present invention will be described below based on the drawings. In addition, this embodiment is an optical multilayer film filter (UV-IR cut filter) suitable for passing light in the visible light band and having good reflection characteristics in the ultraviolet band below a predetermined wavelength and the infrared band above a predetermined wavelength. An example of

[0049] (Structure of Optical Multilayer Film Filter)

[0050] figure 1 It is a cross-sectional view schematically showing the structure of the optical multilayer film filter of this embodiment. The optical multilayer film filter 10 has a glass substrate 1 as a light-transmitting substrate, a multilayer inorganic thin film 2 and a fluorine-containing organosilicon compound film 5 in its configuration.

[0051] In terms of the material of the inorganic thin film 2, there are the following layers in its composition: TiO with a high refractive index layer (H) formed of a high r...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Thicknessaaaaaaaaaa
Densityaaaaaaaaaa
Login to View More

Abstract

The invention provides an optical multilayer filter and manufacturing method thereof. The optical multilayer filter can reduce adhesion of dust and remove the adhered dust easily. In the inorganic thin film 2, on surface of the glass substrate, a TiO2 layer and an SiO2 layer are laminated in sequence, the upmost layer being composed of SiO2 layers (2L30); the optical multilayer filter 10 has an inorganic thin film 2 composed of a plurality of layers on a substrate including a fluorinated organic silicon compound film 5 formed on a surface of the inorganic thin film 2. Density of the SiO2 that forms the upmost layer is 1.9g / cm<3> to 2.1g / cm<3>. The upmost layer SiO2 layer of the inorganic thin film 2 is set as a first layer, an TiO2 layer with density 4.1g / cm<3> to 4.8g / cm<3> is formed selectively on a second layer (2H30) and a fourth layer (2H29) at a lower layer of the first layer SiO2 layer and an SiO2 layer with density 1.9g / cm<3> to 2.1g / cm<3> is formed selectively the third layer (2L29). The SiO2 layer and the TiO2 layer are formed with film by vacuum vaporization method.

Description

technical field [0001] The present invention relates to an optical multilayer film filter, a method for manufacturing the optical multilayer film filter, and an electronic device incorporating the optical multilayer film filter. Background technique [0002] As optical multilayer filters, there are known half mirrors, infrared cut filters, low-pass filters, and the like, and these optical multilayer filters are often used in electronic devices. The optical multilayer filter is composed of a substrate and an inorganic thin film formed on the substrate by vapor deposition or the like. [0003] Inorganic thin films are made of titanium dioxide (TiO 2 ) and other high refractive index films and silicon dioxide (SiO 2 ) and other low-refractive-index films are alternately laminated to form a multi-layer film structure. Generally, a silicon dioxide film functioning as a protective film is formed on the outermost layer of the inorganic thin film, so the surface has no conductivi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B5/20G02B1/10C23C14/10C23C14/24
Inventor 澁谷宗裕
Owner SEIKO EPSON CORP
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com