Silicic double probe PMOS radiation dose meter based on insulator
A silicon-on-insulator and radiation dose technology, applied to dosimeters, etc., can solve the problems of dosimeters not working normally and being easily affected by external environmental factors, etc., and achieve the effects of repeated use, wide application range, and reduced production costs
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0041] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0042] Such as figure 1 as shown, figure 1 It is a structural schematic diagram of the SOI-based dual-probe PMOS radiation dosimeter provided by the present invention. The radiation dosimeter uses the SOI of top silicon 16, buried oxide layer 4 and bottom silicon 3 as the basic structure from top to bottom. The radiation dose Count includes:
[0043] The positive gate oxide layer 9 disposed on the upper surface of the top silicon layer 16, the positive gate polysilicon layer 10 disposed on the upper surface of the positive gate oxide layer 9, the positive gate polysilicon layer 11 disposed on the upper surface of the positive gate polysilicon layer 10, and the positive gate polysilicon layer 11 disposed on the upper surf...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com