System and method for polishing surface of tape-like metal base material

Abstract

Provided are a system and a method for uniformly polishing a surface of a tape-like metal base material in a unit of several hundred meters, at a high speed and a high efficiency. The polishing system for continuously polishing the surface of the tape-like metal base material to be polished is provided with an apparatus for continuously running the tape-like metal base material; an apparatus for applying a prescribed tension to the tape-like metal base material; a first polishing apparatus for performing initial polishing at random to the surface of the tape-like metal base material to be polished; and a second polishing apparatus for performing final polishing to the surface of the tape-like metal base material to be polished, along the running direction. A polishing mark is formed by the final polishing, along the running direction on the surface to be polished.

Description

technical field

[0001] The invention relates to a device and method for grinding a strip-shaped metal substrate to a predetermined surface roughness. In particular, it relates to a surface polishing system and polishing method for a strip-shaped metal used as a substrate for forming a functional thin film exhibiting superconducting, ferroelectric, and ferromagnetic properties. Background technique

[0002] Surface treatment of substrate materials is an important issue in products that form functional thin films on metal strip-shaped substrates and use them.

[0003] Generally, a strip-shaped metal substrate is processed into a strip shape by cold rolling or hot rolling. However, this processing is due to the existence of scratches and crystal defects formed by rolling, so unless these are removed, the intended functional film properties cannot be obtained.

[0004] Therefore, a method of removing scratches or crystal defects by grinding the surface while making the surface...

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