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Treating liquid for removing fungus spot on plate or film and treating method

A processing method and technology of processing liquid, applied in the field of masks, which can solve the problems of scratches on graphics, inability to remove, scratches on product surfaces, etc.

Active Publication Date: 2009-08-19
深圳清溢光电股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, manual repairing methods are often used in the industry to remove such defects (such as using a scraper to manually scrape mildew spots under a microscope). It is difficult to clean after contamination; and such defects are restricted by the size, shape, and position of the defect under the condition of manual scraper repair. When the defect is small or exceeds the limit of manual and tool repair capabilities, it cannot be removed, or after manual scraping fails. It is easy to cause the product to be scrapped, and the product needs to be remade

Method used

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  • Treating liquid for removing fungus spot on plate or film and treating method
  • Treating liquid for removing fungus spot on plate or film and treating method
  • Treating liquid for removing fungus spot on plate or film and treating method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] Get concentration and be that 15 grams of hydrochloric acid of 20% (the effective content of hydrochloric acid is 3 grams, water 12 grams), oxalic acid 1 gram, thiourea 1 gram joins in 83 grams of deionized water, stirs evenly, makes for removing dry plate or Treatment solution for mildew in film.

[0039] Take the dry plate / film with mildew defects, find the mold defects on the film surface of the dry plate, mark the position of the defect on the back of the dry plate, and stick a protective film on the film surface to protect the effective graphics in the graphic area; Then prepare a dust-free cloth, deionized water, absolute ethanol, cotton swabs, etc.; use a dust-free cloth dipped in absolute ethanol to wipe off the surface of the mildew defect and the surface near the defect, and then use a cotton swab dipped in water to remove the mildew defect After the surface is wetted, use a cotton swab to dip the prepared treatment solution under a microscope (5X magnificatio...

Embodiment 2

[0043] Get concentration and be 75% nitric acid 12 grams (the effective content of nitric acid is 9 grams, water 3 grams), acetic acid 3 grams, thiourea 3 grams join in 82 grams of deionized water, stir evenly, make for removing dry plate or Treatment solution for mildew in film.

[0044] Take the dry plate / film with mildew defects, find the mildew defects on the film surface of the dry plate, and mark the position of the defect on the back of the dry plate; then prepare a dust-free cloth, deionized water, absolute ethanol, and cotton swabs etc.; use a dust-free cloth dipped in absolute ethanol to wipe the surface of the mildew defect and the surface near the defect clean, then use a cotton swab to wet the surface of the mildew defect, and then use a cotton swab to dip it under a microscope (5X magnification). The prepared treatment liquid is added dropwise on the surface of the mildew defect, and the defect will disappear after 10-30 seconds; then use a dust-free cloth to get...

Embodiment 3

[0047] Get concentration and be that 10.2 grams of sulfuric acid of 98% (the effective content of sulfuric acid is 10 grams, 0.2 grams of water), 1 gram of oxalic acid, 1 gram of acetic acid, 3 grams of sodium oxide are added to 84.8 grams of deionized water, stirred evenly, prepared for Treatment solution for removing mildew in dry plates or films.

[0048]Take the dry plate / film with mildew defects, find the mold defects on the film surface of the dry plate, mark the position of the defect on the back of the dry plate, and stick a protective film on the film surface to protect the effective graphics in the graphic area; Then prepare a dust-free cloth, deionized water, absolute ethanol, cotton swabs, etc.; use a dust-free cloth dipped in absolute ethanol to wipe off the surface of the mildew defect and the surface near the defect, and then use a cotton swab dipped in water to remove the mildew defect After the surface is wetted, use a cotton swab to dip the prepared treatment...

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Abstract

The invention relates to treatment fluid for removing the mildew in a dry plate or film, which is prepared by the following components in accordance with the weight percentage of: one percent to three percent of organic acid, one percent to ten percent of inorganic acid, one percent to three percent of reducing agent, and eighty-five percent to ninety-five percent of de-ionized water, wherein, the organic acid is oxalic acid and / or acetic acid, and the inorganic acid is nitric acid, hydrochloric acid or sulfuric acid. The invention also relates to a method which adopts the treatment fluid for handling the mildew in the dry plate or film. By using the treatment fluid and the processing method provided by the invention, the mildew type defects of the dry plate or film can be removed in a shorter period, however, the graphics layer or emulsion layer of the dry plate or film is not affected, the defects such as scratching, graphic abnormality, surface contamination and the like on the dry plate or film due to manual handling are overcome, and the scrap rate of the dry plate or film, which is caused by impossible repairing or failed manual repair of the defects is reduced.

Description

【Technical field】 [0001] The invention relates to the mask plate industry, in particular to a treatment liquid and a treatment method for removing mold spots in dry plates or films. 【Background technique】 [0002] In the mask industry, the ultrafine silver salt glass plate (such as: Emulsion-ultrafine silver salt dry plate) for recording graphics and text information and the soft silver salt film (film) for recording graphics and text information are often used. ), due to factors such as surface purification of raw materials, production environment, post-processing development method, development equipment, chemical solution or production equipment are polluted or the production equipment itself is not corrosion-resistant during the production process of dry board and film. The surface of the surface is contaminated with metal ions with relatively active chemical properties - such as aluminum, magnesium, copper, iron, etc. - and the developer and the silver halide on the sur...

Claims

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Application Information

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IPC IPC(8): G03C1/06G03C1/33G03C11/00G03C11/06
Inventor 王金木
Owner 深圳清溢光电股份有限公司