Method for removing hydrogen detained on first wall in magnetic constraint device by ion involution oxygen plasma
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- INST OF PLASMA PHYSICS CHINESE ACAD OF SCI
- Publication Date
- 2009-09-16
- Estimated Expiration
- Not applicable Β· inactive patent
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Figure 1
Abstract
Description
technical field
[0001] The invention relates to the fields of vacuum technology and magnetic confinement fusion, in particular to a method for removing hydrogen retention on the first wall of a magnetic confinement device by ion cyclotron oxygen plasma. Background technique
[0002] Impurity suppression is an important issue in tokamak operation. The current tokamak needs to limit the impurities in the plasma through the first wall tempering to obtain high-quality plasma. In the upcoming all-superconducting tokamak devices with quasi-steady-state high-parameter plasma operation, such as EAST and ITER, in addition to completing impurity confinement, it is also necessary to solve the retention of hydrogen isotopes in the vacuum chamber. The research on the removal technology and mechanism of a-C:H(D,T) deposition layer in the tokamak fusion experimental device can provide scientific understanding for the construction, operation and experiment of EAST and future fusion reactor...