Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Color resist composition and a color filter using the same

A technology for resists and compositions, applied in the field of color resist compositions, can solve the problems of undisclosed special effects of dialkylamides, color resist floating, peeling defects, etc.

Inactive Publication Date: 2009-09-30
ADEKA CORP
View PDF4 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The pattern is formed by development with an alkaline developer, and if the pattern is fine, there is a problem that the floating and peeling of the color resist that should remain during development may cause defects
However, it is not disclosed that the combination of propylene glycol monomethyl ether acetate (PGMAC) and dialkylamide has a special effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Color resist composition and a color filter using the same
  • Color resist composition and a color filter using the same
  • Color resist composition and a color filter using the same

Examples

Experimental program
Comparison scheme
Effect test

manufacture example 1

[0100] [Production Example 1] Production of Alkali Developable Resin Composition 1

[0101] Production of 1,1-bis(4'-hydroxyphenyl)-1-(1"-biphenyl)-1-cyclohexylmethane

[0102] 70.5 g of biphenylcyclohexyl ketone, 200.7 g of phenol, and 10.15 g of thioacetic acid were charged, and 40.0 g of trifluoromethanesulfonic acid was added dropwise at 18° C. over 20 minutes. After reacting at 17-19° C. for 18 hours, 500 g of water was added to stop the reaction, 500 g of toluene was added, and the organic layer was washed with water until the pH was 3-4 to extract the organic layer. Toluene, water and excess phenol were distilled off. Toluene was added to the residue, and the precipitated solid was collected by filtration and dispersed and washed with toluene to obtain 59.2 g of pale yellow crystals (51% yield). The melting point of the pale yellow crystals was 239.5°C, and it was confirmed that the pale yellow crystals were the target substance.

[0103] Production of 1,1-bis(4'-ep...

Embodiment 1

[0107] [Example 1] Preparation of color resist composition

[0108] Carbon black paste ABK-81C (manufactured by Mikuni Color Co., Ltd.) with a carbon black content of 20% by mass, a dispersant content of 5.7% by mass, and PGMAC as a dispersion medium, and PGMAC of the alkali-developable resin composition 1 obtained in Production Example 1 above Solution, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime) ethyl ketone and organic solvent according to the following [formulation Ratio] mixed to obtain color resist compositions No.1 to No.14 of the present invention.

[0109] [matching ratio]

[0110] (A) Pigment: 7 parts by mass of carbon black

[0111] (B) Alkali-developable resin composition (solid content conversion) 3.5 mass parts

[0112] (C) 1.5 parts by mass of photopolymerization initiator

[0113] (D) Organic solvent Composition described in the following [Table 1] 86 mass

[0114] [Table 1]

[0115] The composition of (D) organic solvent of embodim...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
boiling pointaaaaaaaaaa
melting pointaaaaaaaaaa
boiling pointaaaaaaaaaa
Login to View More

Abstract

The present invention provides a color resist composition and a color filter using the same. The color resist composition contains (A) coloring matter, (B) alkali developable resin composition, (C) photopolymerization initiator and (D) organic solvent, the (D) organic solvent contains PGMAC and dialkylacylamide selected from DMAC or DEAC as necessary components, thereby restraining deflection caused by upwards float or removal of the color resist at time of color resist development with alkali developing liquid. Furthermore, surface roughness concentration of a light shading layer or the coloring layer may be reduced by using the color resist composition, and developing unevenness of the color filter may be prevented.

Description

technical field [0001] The present invention relates to a color resist composition preferably used for producing color filters used in liquid crystal display elements of liquid crystal displays, plasma displays, electroluminescent panels, video cameras, and other display elements, and a color resist composition using the same object color filter. Background technique [0002] Regarding the color resist composition, many studies have been conducted on a color resist composition containing a pigment, an alkali-developable resin composition, a photopolymerization initiator, and an organic solvent. The color resist can be polymerized and cured by irradiating ultraviolet rays or electron rays, so it is widely used in photocurable inks, photosensitive printing plates, printed wiring plates, various photoresists, color liquid crystal display devices, image sensors, etc. It is widely used in the manufacture of components, namely color filters. Recently, it is desired to form fine ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G02F1/1335
CPCG02B5/20G02B5/201G03F7/004G03F7/0045G03F7/027
Inventor 出町泰之佐藤梓实名轮希石黑智仁中尾慎吾相原孝宏品川真澄长坂一辉渊上和幸
Owner ADEKA CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com