Method for preparing carbonitride modified film on surface of medical titanium alloy implant material
An implant material, a technology of titanium alloy, applied in the field of deposition and preparation of biomedical carbon nitride modified films, can solve problems such as toxicity, and achieve the effects of excellent corrosion resistance, stable chemical properties, and superior mechanics
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Embodiment 1
[0025] NiTi bio-titanium alloy is used as the substrate. Using ultra-high vacuum magnetron sputtering system, use mechanical pump and molecular pump to pump the reaction chamber to the background vacuum degree ≤1.0×10 -3 Pa, first use pure titanium as the target material to sputter for 10 minutes, use argon (Ar) as the sputtering gas, the flow rate of argon gas is 20sccm, adjust the sputtering power to 150W, and deposit a layer of transition titanium on the surface of NiTi bio-titanium alloy. layer. Then take high-purity graphite as the target material, use the mixed gas of argon and nitrogen as the working gas, the flow rate of argon gas is 5 sccm, the flow rate of nitrogen gas is 25 sccm, continue sputtering for 5 hours, and deposit CN on the titanium transition layer. x film.
[0026] For comparison, the same method was used to deposit the Ti transition layer on the surface of the NiTi alloy, and then continue to deposit the commonly used clinical DLC medical modified fil...
Embodiment 2
[0029] NiTi bio-titanium alloy is used as the substrate. The ultra-high vacuum magnetron sputtering system is adopted, and the reaction chamber is pumped to a background vacuum degree of ≤1.0×10 by using a mechanical pump and a molecular pump. -3 Pa. First, pure titanium was used as the target material for sputtering for 15 minutes, argon was used as the sputtering gas, the flow rate of argon was 30 sccm, the sputtering power was adjusted to 100 W, and a titanium transition layer was deposited on the surface of the NiTi bio-titanium alloy. Then take high-purity graphite as the target material, use the mixed gas of argon and nitrogen as the working gas, the flow rate of argon gas is 10 sccm, the flow rate of nitrogen gas is 20 sccm, continue sputtering for 5 hours, and deposit CN on the titanium transition layer. x film. Adjust the amount of argon or argon / nitrogen gas flow through the gas flow meter, the titanium transition layer and CN will be deposited x The working press...
Embodiment 3
[0032] The Ti6Al4V bio-titanium alloy was used as the substrate. The ultra-high vacuum magnetron sputtering system is adopted, and the reaction chamber is pumped to a background vacuum degree of ≤1.0×10 by using a mechanical pump and a molecular pump. -3 Pa. First use pure titanium as the target material for sputtering for 10 minutes, use argon as the sputtering gas, the flow rate of argon gas is 15 sccm, adjust the sputtering power to 200W, and deposit a layer of titanium transition layer on the surface of the T6Al4V alloy. Then take high-purity graphite as the target material, use the mixed gas of argon and nitrogen as the working gas, the flow rate of argon gas is 15 sccm, the flow rate of nitrogen gas is 15 sccm, continue sputtering for 2 hours, and deposit CN on the titanium transition layer. x film.
[0033] For comparison, in the same way, a titanium transition layer was pre-deposited on the surface of another Ti6Al4V alloy, and then continued to deposit a diamond-lik...
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