Temperature control device of projection object lens of lithography machine

Abstract

The invention relates to a temperature control device of a projection object lens of a lithography machine, comprising at least one water sleeve, at least one temperature sensor, a flow distributing and collecting plate, a circulating water control unit and a temperature control unit of the projection object lens. The water sleeve comprises a water sleeve body and a water pipe which is enwound onthe outer wall of the water sleeve body in a double-spiral mode; the temperature sensor is used for sensing the temperature of the projection object lens of the lithography machine; the flow distributing and collecting plate provides circulating water for the water pipe of the water sleeve through a flow distributing and collecting pipe and receives recirculation water in the water pipe of the water sleeve body, and the flow distributing and collecting pipe is provided with an adjusting valve used for controlling the flow rate of the circulating water in the water pipe; the circulating water control unit controls the temperature of the circulating water and provides circulating water for the flow distributing and collecting plate through a transmission pipe; and the temperature control unit of the projection object lens is used for receiving the temperature of the projection object lens sensed by the temperature sensor and adjusting the temperature of the circulating water provided bythe circulating water control unit and the opening degree of the adjusting valve according to the temperature of the projection object lens. The temperature control device of the projection object lens of the lithography machine can ensure the uniformity and stability of the integral temperature of the projection object lens.

Description

technical field [0001] The invention relates to a temperature control device for a projection objective lens of a lithography machine. Background technique [0002] Lithography machine is the core equipment for large-scale and VLSI manufacturing. It includes thirteen subsystems such as exposure system, workpiece table, mask table, silicon wafer transmission system, workpiece transmission system, and micro-environment system. Among them, the exposure system and the microenvironment system are the key systems to ensure the quality of the exposure lines of the lithography machine, and the temperature control of the projection objective lens of the lithography machine is the key. [0003] The lithography machine has extremely high requirements on the internal environment of the projection objective lens, especially the requirements on temperature stability and uniformity. Since laser exposure is performed for a long time, the internal temperature of the projection objective cha...

AI Technical Summary

Problems solved by technology

[0007] In order to solve the technical problem of uneven temperature field inside the projection objective lens of the prior art lithography machine, it is necessary to provide a temperature control device for the projection objective lens of the lithography machine that can make the internal temperature field of the projection objective lens of the lithography machine uniform.

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