Method for realizing continuous gluing of semiconductor wafer and purification system thereof

Abstract

The invention provides a method for realizing the continuous gluing of a semiconductor wafer and a purification system thereof, which are used for improving the efficiency of semiconductor gluing, simultaneously purifying air in a working room, improving the indoor air of the gluing working room and being conductive to physical and psychological health of working staff. The technology mainly comprises the following steps: gluing is carried out on the semiconductor wafer; removing a first protective disc filled with waste glue when the waste glue in the protective disc on the gluing machine is accumulated to a certain extent and needs to be cleared up; placing the first protective disc filled with the waste glue into a liquid trough filled with an organic solvent, using the organic solvent for soaking the first protective disc, removing after the dissolution of the waste glue for standby after the complete volatilization of the organic solvent, and arranging the liquid trough in a ventilation place which is isolated with the working room; and simultaneously mounting a second protective disc for standby after the completion of the clearing up on the gluing machine while removing the first protective disc filled with the waste glue. The method and the purification system are mainly used for the gluing technology before the semiconductor lithography.

Description

technical field [0001] The invention relates to the manufacture of semiconductors, in particular to the clean and environment-friendly technology of photoresist coating of semiconductors. Background technique [0002] In the process of manufacturing semiconductor epitaxial wafers, multiple processes will involve the process of photolithography many times, taking the manufacture of LED epitaxial wafers with silicon growth substrates as an example. Grooving on the growing silicon substrate, making complementary P electrodes, making adhesive layers, edge removal, passivation, and making P electrodes all require photolithography. Before photolithography, the film needs to be coated with a mask. And glue mask must use glue machine. The coating machine can evenly coat the photoresist on the film. [0003] Since the production of semiconductor epitaxial wafers is now completed in a high-purity purification room, the purification room is a closed space isolated from the outside wo...

AI Technical Summary

Problems solved by technology

[0009] Since the purification room is an ash-free space, it is generally not allowed to use cotton balls. However, cotton balls must be used in the above method of cleaning the disk protection. pollution clean room;

[0010] Both photoresist and acetone are toxic items, especially acetone is very volatile. Even if there is a ventilation system to purify the air in the purification room, the damage to the human body from the toxic gas will continue during the entire cleaning process of the protective plate. Therefore, it is necessary to Further improve the working environment for staff

In addition, due to the laying of foot pads on the floor, a large number of foot pads around the glue applicator prevent the circulation of indoor air

Images