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Multichannel collecting and correcting device of alignment signal of photoetching machine

A multi-channel acquisition and calibration device technology, which is applied in the field of multi-channel acquisition and calibration devices for alignment signals of lithography machines, can solve problems such as differences between SS signals and set values, inconsistencies in signal acquisition channels, etc., to eliminate influence and save software The effect of calibration

Active Publication Date: 2010-08-11
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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Problems solved by technology

[0004] In a silicon chip alignment signal acquisition and processing system disclosed in Chinese patent 200810035115.9, there are inconsistencies between different signal acquisition channels; and due to the influence of other factors such as noise, there is a certain gap between the SS signal and the set value. difference

Method used

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  • Multichannel collecting and correcting device of alignment signal of photoetching machine
  • Multichannel collecting and correcting device of alignment signal of photoetching machine
  • Multichannel collecting and correcting device of alignment signal of photoetching machine

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Embodiment Construction

[0019] In the following, preferred embodiments according to the present invention will be further described with reference to the accompanying drawings.

[0020] figure 2 A schematic diagram of the alignment signal generation process is shown. It should be pointed out that in order to improve the signal-to-noise ratio in the process of signal transmission, detection and conversion, the amplitude of the laser signal is usually modulated by an optical signal modulator. refer to figure 2 , the modulated illumination beam is irradiated onto the alignment mark, and the periodic light spot stripes 305 are generated by the imaging module. During the alignment scanning process, the periodic light spot stripes 305 sweep across the reference grating 306 at a constant speed along with the movement of the workpiece table, and are transmitted to the photoelectric sensor through the detection optical fiber 307 to obtain a light intensity signal curve 308 .

[0021] image 3 A schemati...

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Abstract

The invention discloses a multichannel collecting and correcting device of an alignment signal of a photoetching machine, which comprises a photoelectric sensor for converting a modulated light intensity signal into a modulated eclectic current signal; a head amplifier for converting the modulated eclectic current signal into a modulated voltage signal; a variable gain amplifier for adjusting the modulated voltage signal into a set amplitude value; an SS signals correcting device for correcting and outputting SS signals generated by the variable gain amplifier; a band-pass filter for filtrating the AC components and the other interference components in the modulated voltage signal; a demodulator for demodulating the modulated voltage signal with a reference signal; and a low-pass filter for filtrating the modulated frequency components in the signal outputted by the demodulator. The device improves the consistency of the SS signals in each channel, leads the one-off adjustment to be effective for a long term, and simplifies a later stage signals-processing flow path.

Description

technical field [0001] The present invention relates to a lithography machine alignment signal multi-channel acquisition and calibration device, in particular to a lithography machine alignment signal multi-channel acquisition that can accurately reflect the correspondence between input light intensity and output signal and can be adjusted once and for a long time. Calibration device. Background technique [0002] In the manufacturing process of integrated circuits (IC) or other micro-devices, multi-layer masks with different mask patterns are sequentially imaged on silicon wafers coated with photoresist under precise alignment by photolithography equipment, such as Semiconductor silicon wafer or LCD board. The main function of the alignment system of the lithography device is to achieve mask-silicon wafer alignment before overlay exposure, so as to meet the requirements of overlay accuracy. At present, most of the alignment devices used in lithography equipment are gratin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00
Inventor 程鹏
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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