Filler circuit unit

Abstract

The invention discloses a filler circuit unit, which comprises a decoupling capacitor, a tie low circuit and a tie high circuit, wherein the decoupling capacitor comprises a first N-type metal-oxide semiconductor (NMOS) transistor and a first P-type metal-oxide semiconductor (PMOS) transistor; the source/drain of the first NMOS transistor is connected with a second power supply; the source/drain of the first PMOS transistor is connected with a first power supply; the tie low circuit comprises a second NMOS transistor and a second PMOS transistor; and the tie high circuit comprises a third NMOS transistor and a fourth PMOS transistor.

Description

technical field [0001] The invention relates to a filling circuit unit, in particular to a filling circuit unit matched with low-connection and high-connection circuits. Background technique [0002] In today's digital integrated circuit design process, in order to meet the requirements of high automation, a standard cell library is usually used to complete the required layout design. Since the standard cell library already has various commonly used cell types (cell types), such as basic logic gate circuits such as AND, OR, NOT, etc., customers can apply the existing cell types in the standard cell library according to the designed architecture to quickly spell out desired design. [0003] In order to meet the requirements of the manufacturing process, each design unit usually presents a rectangular shape when pieced together by automated tools, so that the input / output terminals (I / O) can be smoothly arranged around the completed design unit. In most cases, a complete des...

AI Technical Summary

Problems solved by technology

[0005] Although the above known filling circuit unit can be used to fill up the gaps between the units, since the gate 16 of the NMOS transistor 12 and the gate 20 of the PMOS transistor 14 in the filling circuit unit are directly connected to the voltage source Vss or Vdd, when When a pulse waveform interference (glitch) occurs, the sudden bias will cause the concentrated current to be directly directed into the gate dielectric layer / inversion layer on the surface of the transistor channel and damage the entire transistor

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