The invention discloses an aluminum / iron-doped
amorphous carbon film / aluminum nano-thin-film memory
resistor storage device and a manufacturing method thereof. According to the method, a
quartz glass substrate serves as a substrate, an iron-doped
amorphous carbon film is prepared through a
pulsed laser deposition method, then two aluminum
layers are evaporated on the
amorphous carbon film through a vacuum hot evaporating method to serve as electrodes, a
voltage trigger is connected, and the memory
resistor storage device is prepared. Under
room temperature, the memory
resistor storage device is in a
high resistance state or a
low resistance state, the resistance switching phenomenon is extremely obvious, writing can be conducted through simple
pulse voltage, and reading is achieved by detecting the resistance states. The aluminum / iron-doped amorphous
carbon film / aluminum nano-thin-film memory resistor storage device has the advantages of being high in writing speed and
repeatability, simple in structure, stable, resistant to vibration, concise in process, free of
pollution to the environment, low in
raw material price, easy to recycle and the like.