Aluminum/iron-doped amorphous carbon film/aluminum nano-thin-film memory resistor storage device and manufacturing method thereof
A technology of memristor and amorphous carbon film, which is applied in the field of memory storage, can solve the problems of cumbersome preparation process and achieve the effects of strong repeatability, simple structure and fast reading and writing speed
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[0022] Prototypes are made according to the above technical solutions. Take quartz glass (SiO 2 ) The substrate is used as the substrate, and the iron-doped amorphous carbon (a-C:Fe) film is prepared by the pulsed laser deposition method. The graphite with a purity of 99.99% and the metal Fe of 99.9% are used as the target source for the coating, and the metal Fe sheet is attached On the graphite target, during operation, uniform doping is achieved through the rotation of the target and the sample substrate, the Fe doping amount is about 10-15 %, the laser energy is 320 mJ / pulse, and the cavity vacuum degree is 1×10 -6 mBar, the substrate temperature is 400-600 °C, the distance between the target and the substrate is 4-6 cm, annealed for 30-60 minutes after coating, and cooled to room temperature naturally. The iron-doped amorphous carbon (a-C:Fe) film was fabricated.
[0023] Then, a vacuum thermal evaporation method is used, that is, controlled by a mask, an aluminum (Al...
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