A kind of aluminum/iron-doped amorphous carbon film/aluminum nano film memristor storage device and preparation method thereof
A technology of memristor and amorphous carbon film is applied in the field of memory storage, which can solve the problems of cumbersome preparation process and achieve the effects of strong repeatability, simple structure and fast reading and writing speed.
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[0022] Prototypes were made according to the above-mentioned technical scheme. Take quartz glass (SiO 2 ) substrate as the substrate, the iron-doped amorphous carbon (a-C:Fe) film was prepared by the pulsed laser deposition method, and the graphite with a purity of 99.99% and the metal Fe with a purity of 99.9% were used as the target source for the coating, and the metal Fe chip was attached On the graphite target, uniform doping is achieved by the rotation of the target and the sample substrate during operation, the Fe doping amount is about 10-15%, the laser energy is 320 mJ / pulse, and the vacuum degree of the cavity is 1×10 -6 mBar, the substrate temperature is 400-600°C, the distance between the target and the substrate is 4-6 cm, anneal for 30-60 minutes after coating, and cool down to room temperature naturally. Complete the fabrication of iron-doped amorphous carbon (a-C:Fe) film.
[0023] Then use the vacuum thermal evaporation method, that is, through the control ...
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