Flexible material vacuum coating machine utilizing Penning discharge source
A vacuum coating machine and flexible material technology, which is applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problems of limited use and high reaction temperature
Active Publication Date: 2013-09-11
合肥科烨电物理设备制造有限公司
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Problems solved by technology
However, the reaction temperature required for chemical vapor deposition is too high, generally about 1000 ° C, and most substrate materials cannot withstand the high temperature of CVD, so its use is greatly limited
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[0018] In order to make the technical means, creative features, goals and effects achieved by the present invention easy to understand, the present invention will be further elaborated below in conjunction with specific illustrations and examples.
[0019] A vacuum coating machine for flexible materials with a Penning discharge ion source, which is coated by a plasma chemical vapor deposition method, is composed of first electrodes 1, 1', second electrodes 2, 2', a first magnetic circuit 3, and a second Magnetic circuit 4, winding roller 5, unwinding roller 6, reversing roller 7, tension roller (not shown in the figure), vacuum system 8, bidirectional feed control unit 9, air intake pipes 10, 10' and power supply 11 Composition, wherein the vacuum system 8 is mainly composed of a vacuum chamber, the first electrodes 1, 1' and the second electrodes 2, 2' are arranged symmetrically in the vacuum chamber, and a magnetic field 12 is formed between the first electrodes 1, 1'. A mag...
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A flexible material vacuum coating machine utilizing the Penning discharge source relates to vacuum coating machines and comprises electrodes, magnetic circuits, a winding roll, an unwinding roll, a reversing roll, a tensioning roll, a vacuum system, a two-way feed control unit, intake tubes and a power supply, wherein the vacuum system is mainly composed of vacuum chambers; two groups of symmetrical electrode structures and magnetic circuit structures are arranged in the vacuum chambers; magnetic fields are formed between two adjacent electrodes; the electrodes, the magnetic circuits and the intake tubes are symmetrically arranged up and down along the axis of the vacuum chambers; and the electron ionization rate is improved to a higher level under the action of high-frequency discharge. The machine has the beneficial effects of realizing three basic processes of chemical vapor deposition, including the transport process of reactants, the chemical reaction process and the process of removing reaction by-products and obtaining the coated film with excellent coat uniformity, high deposition, large area, high smoothness and high adhesion relative to the known film coating method and with lower temperature process.
Description
technical field [0001] The invention relates to a vacuum coating machine, in particular to a vacuum coating machine for flexible materials with a Penning discharge ion source, which is used for raw material films (substrates) such as flexible materials (such as PET) materials commonly used in the semiconductor, solar film, decorative materials and packaging industries. On the surface, through the PECAD (Plasma Enhanced Chemical Vapor Deposition) method, using a high-density Penning discharge ion source (PDP), a nano-silicon-based oxide is deposited as a solid film. Background technique [0002] Previously, there are known vacuum physical and chemical vapor deposition coating (PVD or CVD) devices, the former has: vacuum evaporation, magnetron sputtering and ion beam plating, molecular beam epitaxy growth coating device, the latter has: plasma enhanced chemical Coating devices such as gas phase deposition (PECAD), metal organic chemical vapor deposition (MOCVD), photochemical ...
Claims
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IPC IPC(8): C23C16/44C23C16/503
Inventor 祝宁
Owner 合肥科烨电物理设备制造有限公司