Axial jog adjustment device for optical element in projection objective system

Abstract

The invention discloses an axial jog adjustment device for an optical element in a projection objective system, relates to jog adjustment for an optical element in a deep ultraviolet projection photo-etching objective system, and solves the problems of poor system rigidity, low natural frequency and difficult processing and manufacturing of the conventional axial jog adjustment device for the optical element. The axial jog adjustment device comprises a lens barrel unit assembly, a lens frame assembly, the optical element, three groups of piezoelectric control drive units, thee groups of reversing and zooming units and three groups of guide rings and guide sliders, wherein the lens frame assembly is arranged in the lens barrel unit assembly; the optical element is arranged in the lens frame assembly; three inner grooves and three outer grooves are formed on an inner annular surface and an outer annular surface of the lens frame assembly; the piezoelectric control drive unit is arranged in each outer groove; the guide rings are fixed on the inner annular surface of the lens barrel unit assembly; three inner bosses and three outer bosses are uniformly arranged on an outer cylindrical surface in the lens assembly; and the guide sliders are fixed on the three outer bosses on the outer cylindrical surface of the lens frame assembly. The axial jog adjustment device is used in the deep ultraviolet projection photo-etching objective system.

Description

technical field [0001] The invention relates to a new device for axial micro-adjustment of an optical element, in particular to the micro-adjustment of an optical element in a deep ultraviolet projection lithography objective lens system. Background technique [0002] Projection lithography equipment is the key equipment in the manufacturing process of large-scale integrated circuits. In recent years, with the continuous improvement of the fineness of the line width of integrated circuits, the resolution of projection optical equipment has gradually improved. At present, the ArF excimer laser with a wavelength of 193.368nm Lithography equipment has become the mainstream equipment for integrated circuit manufacturing at 90nm, 65nm and 45nm nodes. The continuous improvement of the overall performance of optical equipment requires its core component, the projection lithography system, to have a higher numerical aperture (NA) and smaller system wave aberration, and then correspo...

AI Technical Summary

Problems solved by technology

[0006] In order to solve the problems of poor system rigidity, low natural frequency, and difficulty in processing and manufacturing existing in the existing optical element axial fine adjustment device, the present invention provides a new device for axial fine adjustment of the optical element of the projection objective lens system

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