Preparation process of sputtering tantalum ring

A preparation process and tantalum ring technology are applied in the field of preparation technology of sputtered tantalum rings, which can solve the problems of increased processing difficulty of sputtered tantalum rings, and achieve the effects of low processing difficulty, high processing efficiency and simple process

Inactive Publication Date: 2010-12-22
NINGXIA ORIENT TANTALUM IND +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0012] Due to the above technical requirements, the processing difficulty of sputtered tantalum rings increases
At present, the processing of sputtered tantalum rings is produced abroad, and there is no similar technology in China.

Method used

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  • Preparation process of sputtering tantalum ring
  • Preparation process of sputtering tantalum ring

Examples

Experimental program
Comparison scheme
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Embodiment Construction

[0025] The preparation process steps of sputtering tantalum ring of the present invention are:

[0026] 1. The ring is made of tantalum bars

[0027] The grain size is required to meet the product requirements, and the same board difference and surface quality meet the requirements of subsequent processing. The specific process can be used:

[0028] First of all, forging is carried out in the way of square first and then flattening, with a total processing rate of 65% to 75%; the first heat treatment is carried out at a temperature of 1000°C to 1100°C for 60min to 120min; The total processing rate is 70% to 80%; the second heat treatment is carried out at 1000°C to 1100°C for 60min to 120min; the finished product is rolled by unidirectional rolling, and the total processing rate is 70% to 80%. %; Under the temperature condition of 1200℃~1400℃, the third heat treatment is carried out for 120min~180min; leveling and blanking, and the preparation of tantalum strips is completed....

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Abstract

The invention relates to a preparation process of a sputtering tantalum ring, comprising the following steps of: firstly preparing a tantalum strip for the ring, welding both ends of the circularly rolled tantalum strip, carrying out thermal treatment and profiling, knurling the inner surface and the outer surface of the tantalum strip, cutting off welded junctions, and carrying out end knurling; then processing a welding notch on the surface of the ring, carrying out acid washing, welding a boss on the welding notch on the surface of the ring, and then carrying out acid washing again; and blasting sand in the specified zone, and finally cleaning by utilizing ultrasonic waves. Each performance index of the sputtering tantalum ring prepared in the preparation process meets the use requirement of a semi-conductor industry, and the preparation process has the advantages of simplicity, low processing difficulty and high processing efficiency.

Description

technical field [0001] The invention belongs to the mechanical processing technology of tantalum materials, in particular to a preparation technology of a sputtering tantalum ring. Background technique [0002] Physical vapor deposition (PVD) is one of the most critical processes in the production process of semiconductor chips. Its purpose is to deposit metal or metal compounds in the form of thin films on silicon wafers or other substrates, and then through photolithography and corrosion etc. The cooperation of the process finally forms the complex wiring structure in the semiconductor chip. Physical vapor deposition is done by sputtering machine, and sputtering tantalum ring is a very important key consumable used in the above process. [0003] There are two main functions of sputtered tantalum rings in the semiconductor process: [0004] First: Restrict the trajectory of the sputtered particles and play a role in focusing; [0005] Second: It absorbs the large particl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23P15/00
Inventor 张春恒李桂鹏同磊汪凯赵红运李兆博张全
Owner NINGXIA ORIENT TANTALUM IND
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