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Precise technology for correcting cutting angles of quartz crystal wafers in large scale

A quartz wafer, large-scale technology, applied in the direction of stone processing equipment, fine working equipment, manufacturing tools, etc., can solve the problems of not having mass production, slow corrosion speed, wafer shape damage, etc., to achieve good calibration consistency, The effect of improving production efficiency and reducing labor intensity

Active Publication Date: 2012-08-15
北京石晶光电科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The problems existing in the traditional process are: each piece of adhesive covering needs to be protected before corrosion, the operation is cumbersome, the larger the correction angle, the greater the corrosion amount, and the corrosion rate is very slow due to the increase in the corrosion amount. Correction 10 It takes about 8 hours; and the long-term corrosion will damage the shape of the wafer, and also cause internal damage to the inside of the wafer, so this process is only suitable for precision angle correction of wafers with small angle deviations, such as within 3 minutes
[0007] Pad correction process for wafers, the method is similar to the principle of corrosion correction process, and does not have the ability of mass production

Method used

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  • Precise technology for correcting cutting angles of quartz crystal wafers in large scale
  • Precise technology for correcting cutting angles of quartz crystal wafers in large scale
  • Precise technology for correcting cutting angles of quartz crystal wafers in large scale

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Embodiment Construction

[0029] The technical solutions of the present invention will be described in further detail below through specific implementation methods.

[0030] The technical scheme adopted in the present invention is: a large-scale accurate calibration process for quartz wafer chamfering, which includes the following steps:

[0031] Step 1. Carry out X-ray angle detection on the cutting angle of the quartz wafer, and mark the detection angle value on the quartz wafer whose angle needs to be corrected out of tolerance according to the orientation when orientation;

[0032] Step 2. After the angle marking is completed, classify the quartz wafers according to the angle range;

[0033] Step 3. Combine quartz wafers within the same range of angles. Two quartz wafers form a group, and each group of quartz wafers is dislocated and laminated. The dislocation width of each group of quartz wafers is the same, and the dislocation width is generally greater than 1mm;

[0034] Step 4. Put each group ...

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Abstract

The invention provides a precise technology for correcting cutting angles of quartz crystal wafers in large scale. The technology comprises the following steps: carrying out X-ray angle detection on the cutting angles of the quartz crystal wafers to directionally mark the quartz crystal wafers; grading the quartz crystal wafers according to angle ranges; combining the quartz crystal wafers withinthe same-grade angle range in pairs, misplacing each group of quartz crystal wafers and then adhering, wherein the misplaced widths of each group of quartz crystal wafers are consistent; grinding each group of adhered quartz crystal wafers in a double-face grinding device in batches; carrying out X-ray angle detection on the cutting angles of the quartz crystal wafers during grinding, completing the primary correction of the cutting angles of the quartz crystal wafers in batches when the angles meet requirements, and then taking the wafers down; and separating each group of quartz crystal wafers in pairs, placing the angle-correcting grinding surfaces of the quartz crystal wafers downwards on the lower disc face of the double-face grinding device, and carrying out double-face grinding on the quartz crystal wafers until two main surfaces of each quartz crystal wafer are parallel.

Description

Technical field [0001] The invention involves a correction production process of a chip angle after crystal cutting. Specifically, it involves a large -scale accurate correction process of a quartz chip cut angle. Background technique [0002] Now the quartz resonant, quartz oscillator, optical low -pass filter used in the field of electronic information technology and optoelectronics applications are the main forms of chips that are sliced, directional screening, angle correction, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding, grinding,After the main processes such as shape processing, the differential fields determine that the angle of the required cutting chip is also different. The higher accuracy requires the cutting angle error within 15 seconds. Generally, it is within 5 points.The understanding is the angle of the cutting direction and the d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B28D5/00B24B37/34
Inventor 李广辉李二周
Owner 北京石晶光电科技股份有限公司