Preparation method of copper indium selenium sulphur (CuInSe2-xSx) film for solar battery
A technology of solar cells and thin films, applied in the manufacture of circuits, electrical components, final products, etc., can solve the problems of poisonous and restricted Se elements, and achieve the effects of low cost, simple equipment, and mild reaction conditions
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Embodiment 1
[0034] Preparation of electrodeposition solution
[0035] The electrodeposition solution was prepared with deionized water at room temperature. Added substances and their concentrations are: 2.5mM CuCl 2 , 9.0mM InCl 3 , 9.5mM SeO 2 , 200mM LiCl.
[0036] Electrodeposition of thin films
[0037] Put the above-prepared solution in an electrodeposition container, the counter electrode is a platinum sheet, the reference electrode is a saturated calomel electrode, the working electrode is a Mo-coated glass, the area is 2cm*2cm, and the electrodeposition adopts a constant potential of -0.55V. The temperature is 25°C, the deposition time is 70 minutes, the solution does not need to be stirred during electrodeposition, and it is operated at room temperature.
[0038] Treatment of Electrodeposited Films
[0039] A part of the electrodeposited thin film is subjected to sulfurization treatment, and the other part is subjected to selenization treatment.
[0040] Sample 1: vulcaniz...
Embodiment 2
[0051] Preparation of electrodeposition solution
[0052] The electrodeposition solution was prepared with deionized water at room temperature. Added substances and their concentrations are: 2.5mM CuCl 2 , 9.0mM InCl 3 , 25mM Na 2 S 2 o 3 , 200mM LiCl.
[0053] Electrodeposition of thin films
[0054] Put the above-prepared solution in an electrodeposition container, the counter electrode is a platinum sheet, the reference electrode is a saturated calomel electrode, the working electrode is ITO glass, the area is 2cm*2cm, the electrodeposition adopts a constant potential of -1.0V, and the solution temperature 25°C, deposition time 30min, no need to stir the solution during electrodeposition, and operate at room temperature.
[0055] Sulfurization of Electrodeposited Thin Films
[0056] Place the electrodeposited film in a vulcanization furnace with H 2 S gas is a source of gaseous sulfur.
[0057] First replace the air in the furnace with Ar gas, the operation is as ...
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