Glass coated target material and preparation method thereof

A technology of target material and glass, which is applied in the field of glass coating target material and its preparation, and achieves the effect of important industrial application value

Inactive Publication Date: 2012-07-25
INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a new glass coating target and its preparation method to solve the problem of magnetron sputtering glass coating target preparation

Method used

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  • Glass coated target material and preparation method thereof
  • Glass coated target material and preparation method thereof
  • Glass coated target material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0019] The preparation method of the glass coating target material of the present invention, concrete steps are as follows:

[0020] Step 1: Prepare the SiAl powder by mechanical mixing method according to the planned proportion, and the mixing time is 6 hours.

[0021] Step 2: Preparing the sputtering cathode target by atmospheric pressure plasma spraying technology.

[0022] Step 3: Use a magnifying glass to observe the appearance of the coating prepared in step 2.

[0023] Step 4: Using an infrared thickness tester to measure the thickness of the coating prepared in Step 2.

[0024] Step 5: Density measurement of the coating prepared in Step 2 using the buoyancy method.

[0025] Step 6: Test the oxygen content of the coating prepared in step 2 by chemical analysis.

[0026] Step 7: Using a scanning electron microscope to observe the structure and composition of the coating prepared in step 2.

[0027] Step 8: Using a metallographic analysis system to measure the porosit...

Embodiment 1

[0029] In this embodiment, the preparation method of the glass coating target material, the specific steps are as follows:

[0030] Step 1: According to the mass percentage and particle size of each component shown in Table 3, SiAl powder was prepared by mechanical mixing method, and the mixing time was 6 hours.

[0031] Table 3 Mass percentage and particle size of each component in SiAl powder

[0032] Component name

Si

Al

Content (wt%)

90

10

Particle size (μm)

45-125

30-100

[0033] Step 2: Prepare the sputtering cathode target by atmospheric pressure plasma spraying technology, and the preparation process is shown in Table 4.

[0034] Table 4 SiAl target preparation process

[0035]

Process parameters

electric current

/ A

Voltage

/ V

Feeding volume

/ g·min -1

Powder feeding air flow

/ L·min -1

Main air flow

/ L·min -1

pa...

Embodiment 2

[0043] In this embodiment, the preparation method of the glass coating target material, the specific steps are as follows:

[0044] Step 1: According to the mass percentage and particle size of each component shown in Table 5, SiAl powder was prepared by mechanical mixing method, and the mixing time was 6 hours.

[0045] Table 5 Mass percentage and particle size of each component in SiAl powder

[0046] Component name

Si

Al

Content (wt%)

95

5

Particle size (μm)

45-125

30-100

[0047] Step 2: Prepare the sputtering cathode target by atmospheric pressure plasma spraying technology, and the preparation process is shown in Table 6.

[0048] Table 6 SiAl target preparation process

[0049]

Process parameters

electric current

/ A

Voltage

/ V

Feeding volume

/ g·min -1

Powder feeding air flow

/ L·min -1

Main air flow

/ L·min -1

par...

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Abstract

The invention relates to the field of preparation of glass coated target materials, in particular to a glass coated target material and a preparation method thereof, which solve the problem of preparation of magnetron sputtering glass coated target materials. The glass coated target material is prepared from SiAl powder serving as a raw material which is prepared by mechanically mixing pure Si powder and pure Al powder, wherein the mixed powder comprises 85 to 95 weight percent of Si powder with particle diameter of between 45 and 125 mu m and 5 to 15 weight percent of Al powder with particlediameter of between 30 and 100 mu m. The glass coated target material is prepared by atmospheric plasma spray coating technology; and the preparation process parameters are that: the current is 400 to 500A, the voltage is 45 to 58V, the powder feed rate is 40 to 60g/minute, the powder feed air flow is 5.0 to 7.0L/minute, the main air flow is 41 to 43L/minute, the main air pressure is 0.45 to 0.55MPa, the secondary air flow is 1.6 to 2.8L/minute, the secondary air pressure is 0.25 to 0.35MPa, the spray coating distance is 100 to 150mm, and the spray coating angle is 75 to 90 degrees. The sputtering cathode target material prepared by the method is suitable for production of coated glass and has great industrial application value.

Description

technical field [0001] The invention relates to the field of preparation of a glass coating target material, in particular to a glass coating target material and a preparation method thereof. Background technique [0002] The development of modern science has promoted the multifunctional trend of glass, such as energy saving, light control, temperature adjustment, etc. The function of coated glass is to allow visible light to pass smoothly, have a high reflectivity for the infrared part of sunlight, and have a high reflectivity for the ultraviolet Some have a higher absorption rate, so that the indoor temperature will not be too high while keeping the indoor lighting unaffected. [0003] At present, coated glass is mostly prepared by magnetron sputtering. Evaporation theory believes that sputtering is caused by gas positive ions bombarding the cathode target, which causes high temperature on the local surface. When the evaporation temperature is reached, atoms will escape. I...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/18C23C14/34C03C17/245C23C4/04
Inventor 徐娜常新春侯万良张甲张春智张凤军王建强全明秀
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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