Normally off gallium nitride field effect transistors (fet)
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- ALPHA & OMEGA SEMICON INT LP
- Publication Date
- 2011-05-25
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Abstract
Description
technical field
[0001] The invention mainly relates to a structure and a preparation method of a semiconductor power device. More precisely, the present invention relates to a gallium nitride (GaN)-based field effect transistor manufactured with a novel device structure and fabrication method, and the normally-off GaN-based field effect transistor has extremely high performance when conducting a large current. low on-resistance. Background technique
[0002] Conventional methods of configuring and fabricating Gallium Nitride (GaN) based Field Effect Transistors (FETs) are still challenged by the technical problem of providing normally off FET transistors with facile fabrication and operational configurations. More specifically, Gallium Nitride (GaN) based FETs are configured to fabricate High Electron Mobility Transistors (HEMTs). For power transistor devices, this type of transistor can replace some of the now common and widely used silicon-based semiconductor power devic...