Method and system for photoengraving graphical sapphire substrate

A patterned sapphire and lithography system technology, which is applied in the field of sapphire substrate production, can solve the problems of low productivity, low pattern consistency, and low resolution of lithography exposure system, so as to avoid damage, process repeatability and stability sex enhancing effect
CN102087484AInactive Publication Date: 2011-06-08长治虹源科技晶体有限公司
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
长治虹源科技晶体有限公司
Publication Date
2011-06-08
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention relates to a method for photoengraving a graphical sapphire substrate. The method comprises the following steps of: carrying out spin coating treatment on a substrate to be photoengraved; aligning and mounting a mask plate and the substrate and setting a projection ratio for projecting a graph of the mask plate to the substrate through a lens control module; regionally projecting and exposing in the projection ratio according to the preset exposure conditions; and developing and processing the substrate. The invention also relates to a system for photoengraving the graphical substrate, comprising a spin coating module for carrying out the spin coating treatment on the substrate to be photoengraved, a mask mounting module for aligning and mounting the mask plate and the substrate, the lens control module for setting the projection ratio for projecting the graph of the mask plate to the substrate, an exposure module for regionally projecting and exposing in the projection ratio according to the preset exposure conditions and a developing module for developing and processing the substrate. The method and the system provided by the invention photoengrave the graphical substrate through graphical projection in a non-contact mode and avoid the defects of low resolution, low production efficiency and low graphical consistency of the system for photoengraving and exposing the graphical substrate.
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Description

technical field

[0001] The invention relates to the field of manufacturing sapphire substrates, in particular to a photolithography method and system for patterning a sapphire substrate. Background technique

[0002] At present, in the process of producing patterned sapphire substrates in most domestic enterprises, most of the lithography exposure systems use contact lithography machines. Due to the equal proportion of lithography transfer, the line width of the pattern is not high, and the pattern size is more than 2 μm. Low yield, low productivity, and poor pattern consistency lead to reduced yield. Contents of the invention

[0003] The technical problem to be solved by the present invention is to provide a non-contact and graphic projection method for the defects of low resolution, low productivity, and low pattern consistency of the photolithography exposure system of the prior art patterned sapphire substrate. Photolithographic method and system for sapphire substra...

Claims

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