Method and device for preparing microchannel in glass material

A glass material and microchannel technology, applied in glass cutting devices, glass manufacturing equipment, manufacturing tools, etc., can solve problems such as high cost, low production efficiency, and limited aspect ratio, and achieve low cost, fast processing speed, The effect of uniform longitudinal morphology

Inactive Publication Date: 2011-06-15
HUAZHONG UNIV OF SCI & TECH
View PDF2 Cites 19 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The problem to be solved by the present invention is to overcome the shortcomings of low production efficiency, high cost and limited aspect ratio of the above-mentioned microchannel preparation technology, and provide a method and device for making microchannels in glass materials

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for preparing microchannel in glass material
  • Method and device for preparing microchannel in glass material
  • Method and device for preparing microchannel in glass material

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0035] Silicate glass is now taken as an example to illustrate the inventive method, by figure 1 , 2 Visible, the present invention utilizes ultrasonic water to assist nanosecond laser to prepare the method for three-dimensional microchannel as follows:

[0036] (1) Fix the ultrasonic cleaning machine filled with distilled water on the horizontal workbench of the three-dimensional platform 1. The body of the ultrasonic cleaning machine 3 is made of transparent material, the power is 50W, and the frequency is 20KHz.

[0037] (2) Fix the silicate glass material to be processed (13mm×5mm×2mm in size) on the support 4 in the ultrasonic cleaning machine, the lower surface of the glass material 7 to be processed is immersed in distilled water, and the upper surface is exposed in the air. Simultaneously CCD camera 10 is connected on the computer so that location and real-time observation processing process;

[0038](3) Using a nanosecond laser with a center wavelength of 1064nm, a ...

example 2-4

[0041] Examples 2-4 adopt the device and process parameters in Table 1, and proceed according to the same working process as Example 1, and the microchannel parameters after processing are shown in Table 2.

[0042] The technological parameter that table one example 2-4 adopts

[0043]

[0044] Table 2 Microchannel parameters after processing

[0045]

[0046] The method of the invention is suitable for preparing three-dimensional microchannels inside various glass materials, as long as the nanosecond laser processing parameters are properly selected.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
diameteraaaaaaaaaa
Login to view more

Abstract

The invention discloses a method and device for preparing a microchannel in a glass material. The method comprises the following steps: (1) the glass material to be treated and inscribed is placed in an ultrasonic environment to ensure that the lower surface of the glass is soaked in clean water and the upper surface of the glass is exposed in air; (2) the laser emitted by a nanosecond laser is focused by a focus lens, the focused nanosecond laser pulse is emitted to the upper surface of the glass material to be treated and inscribed vertically, the focus of the nanosecond laser pulse is on the lower surface of the glass material to be treated; and (3) a laser beam is emitted by the nanosecond laser from bottom to top according to a preset scanning path to ensure that a three-dimensional microchannel is inscribed in the glass. The device in the invention contains a three-dimensional platform, an ultrasonic cleaner, a support and a focus mirror. When the device in the invention works, the ultrasonic cleaner is fixed on the three-dimensional platform; and the glass material to be treated is placed in the cavity of the ultrasonic cleaner through the support, and the focus mirror is fixed on the vertical shaft of the three-dimensional platform. By adopting the method in the invention, the defects of the prior art such as low production efficiency, high cost and limited depth-to-width ratio can be overcome.

Description

technical field [0001] The invention relates to nanosecond laser processing, in particular to a method and device for preparing three-dimensional microchannels in glass materials by using ultrasonic water-assisted nanosecond lasers. The invention is suitable for preparing micro-nano fluid devices inside various glass materials. Background technique [0002] Microfluidic chips characterized by micropipe networks are currently a very active research field, and have been applied in chemical analysis, material synthesis, and cell culture. Glass has become a commonly used microfluidic chip material due to its stable upper surface properties, good light transmission and weak fluorescence background. At present, the processing of glass chips is mainly based on photolithography and wet etching, that is, using photolithography technology to make pattern windows on the sacrificial layer, and then using chemical etching solution for etching. For the preparation of three-dimensional mi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C03B33/08C03C23/00
Inventor 蔡志祥曾晓雁段军胡乾午
Owner HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap