Preparation method of photonic crystal inverse opal film

Abstract

The invention relates to a preparation method of a photonic crystal inverse opal film. The preparation method is as follows: silica is used as the substrate, polystyrene is used as the forward opal template material, tantalum pentachloride is used as the inverse opal raw material, ethanol is used as the solvent, the vertical deposition method is adopted to prepare a forward opal convex reticular structure firstly, the film layer is dried and sintered to form a template, the sol-gel method is adopted for filling to obtain an inverse opal concave reticular film layer, and the film layer is sintered at a high temperature to prepare the inverse opal concave reticular film. The structure is arranged neatly and orderly and has a complete band gap; the mesh diameter is 310nm which is approximately equal to the convex diameter of the forward opal of the template, the thickness of the film layer is 4960nm, the chemical and physical properties are good, and the film can be matched with various chemicals; the preparation method is advanced and reasonable, the technological process is short, and the effect is good; and the preparation method is a very ideal preparation method of the photonic crystal inverse opal film.

Description

technical field [0001] The invention relates to a method for preparing a photonic crystal inverse opal film, which belongs to the technical field of preparation and application of inorganic materials. Background technique [0002] The 21st century will be the century of photons, and the application of photonic crystals and their devices has become an important topic in the field of scientific research. [0003] Photonic crystals have a wide photonic band gap. Since most materials are in the visible light and short-wave bands, the dielectric constant is in complex form, that is, the dielectric constant has an imaginary part, which will cause absorption, and the size of the periodic unit cell constant corresponds to the band gap. , making the preparation of photonic crystals in the visible light band more difficult. [0004] At present, there are few researches on photonic crystals in the visible light band. First, the types of materials used are limited. For example, most of...

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Problems solved by technology

[0004] At present, there are few researches on photonic crystals in the visible light band. First, the types of materials used are limited. For example, most of them use semiconductor Si, SiO 2 , GaAs, TiO 2 Second, the photonic band gap formed by these materials is generally narrow, and some of them also have absorption

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