Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Multi-resistance-state resistance random access memory and method for implementing multiple resistance states utilizing same

A resistive memory, memory technology, applied in static memory, digital memory information, information storage, etc., can solve the problems of insufficient research on multi-value memory applications, low power consumption and process compatibility, and improve storage density and compatibility. Good, simple craftsmanship

Inactive Publication Date: 2012-01-04
PEKING UNIV
View PDF3 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Based on SiO 2 The resistive memory has shown good bipolar resistive characteristics, has the advantages of low power consumption and good process compatibility, but its application in multi-valued memory has not been fully studied

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multi-resistance-state resistance random access memory and method for implementing multiple resistance states utilizing same
  • Multi-resistance-state resistance random access memory and method for implementing multiple resistance states utilizing same
  • Multi-resistance-state resistance random access memory and method for implementing multiple resistance states utilizing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] A multi-resistance RRAM (also referred to as a multi-level RRAM) proposed by the present invention will be described in detail below with reference to the drawings and embodiments.

[0027] The multi-resistance resistive variable memory of the present invention is a MIM structure (MIM refers to a sandwich structure composed of metal, insulator, and metal three-layer film), including a top electrode (TE), a resistive variable layer (for oxide) and a bottom electrode ( BE). The metals of the top and bottom electrodes are prepared by sputtering, evaporation or MOCVD (metal organic compound chemical vapor deposition), SiO 2 Prepared by plasma-enhanced chemical vapor deposition. Such as figure 1 As shown, the embodiment of the present invention is Ag / SiO 2 / Pt / Ti / SiO 2 A multi-level resistance resistive memory device with / Si structure. Utilizing the bipolar resistance switching characteristics of the device, the resistance switching memory can generate four resistance ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of semiconductor manufacturing, and discloses a multi-resistance-state resistance random access memory. The memory comprises a top electrode, a resistance change layer and a bottom electrode from top to bottom, wherein the resistance change layer is an oxide. The invention also provides a method for implementing multiple resistance states by utilizing the memory. The multi-resistance-state resistance random access memory provided by the invention is a device in an MIM (metal-insulator-metal) structure based on a SiO2 material. Under an appropriate operation method, the device can generate multi-stage resistance states, multi-bit memory can be realized in a unit, and the memory density of the memory can be improved; and the material based on SiO2 is adopted for the resistance change layer of the multi-resistance-state resistance random access memory, the memory and the method provided by the invention have the advantages of simple technology and good processing compatibility with the CMOS (complementary metal-oxide-semiconductor transistor) technology.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a multi-resistance resistive variable memory and a method for realizing multi-resistance using the same. Background technique [0002] Traditional memories use binary to complete information storage, which is commonly referred to as 0 and 1. With the development of the integrated circuit industry, the market has higher and higher performance requirements for memories - low power consumption, high speed, Easy integration and multi-value storage, etc. In multi-value storage, each node is required to generate multiple (for example, four) stable states (multiple resistance states in resistive memory), so as to correspond to different storage values ​​one-to-one. The application of multi-value storage technology can Improving storage density and increasing storage capacity will greatly promote the development of memory. [0003] Resistive variable memory is a new...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L45/00H01L27/24G11C13/00
Inventor 刘力锋于迪高滨陈冰张飞飞康晋锋
Owner PEKING UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products