Silicon based substrate and fabrication method thereof
A technology of a silicon-based substrate and a manufacturing method, which is applied in semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, semiconductor devices, etc., can solve problems such as increased production costs, waste of resources, and excessive wiring density, and achieve high wiring. Density, the effect of saving production costs
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[0047] see Figure 1A to Figure 1L , Figure 1A to Figure 1L It is a schematic cross-sectional flow diagram of the method for fabricating the silicon-based substrate 10 according to the first embodiment of the present invention.
[0048] see Figure 1A , firstly, a silicon wafer 100 is provided. The silicon wafer 100 has a first surface 102 and a second surface 104 opposite to the first surface 102 .
[0049] see Figure 1B , and then, a multi-layer first dielectric layer 112 and a multi-layer first conductive circuit layer 114 are formed on the first surface 102 of the silicon wafer 100 by using a wafer-level semiconductor manufacturing process. The first dielectric layer 112 and the first conductive circuit layer 114 are laminated alternately to form the first circuit substrate 110 . Due to the adoption of wafer-level semiconductor manufacturing process, the wiring density of the first conductive circuit layer 114 can reach nanometer level (nanometer level). The first di...
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