Unlock instant, AI-driven research and patent intelligence for your innovation.

Silicon based substrate and fabrication method thereof

A technology of a silicon-based substrate and a manufacturing method, which is applied in semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, semiconductor devices, etc., can solve problems such as increased production costs, waste of resources, and excessive wiring density, and achieve high wiring. Density, the effect of saving production costs

Active Publication Date: 2012-02-01
YIGFEBOS YOULE LLC
View PDF3 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in fact, the silicon substrate is used for packaging and the stacked circuit structure electrically connected to the circuit board does not require such a high wiring density. Therefore, it is easy to cause waste of resources and increase production costs.
In addition, in actual production, another aspect of the silicon-based substrate is the stacked circuit structure that is electrically connected to the circuit board during packaging. Fabrication of Wiring Density

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Silicon based substrate and fabrication method thereof
  • Silicon based substrate and fabrication method thereof
  • Silicon based substrate and fabrication method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0047] see Figure 1A to Figure 1L , Figure 1A to Figure 1L It is a schematic cross-sectional flow diagram of the method for fabricating the silicon-based substrate 10 according to the first embodiment of the present invention.

[0048] see Figure 1A , firstly, a silicon wafer 100 is provided. The silicon wafer 100 has a first surface 102 and a second surface 104 opposite to the first surface 102 .

[0049] see Figure 1B , and then, a multi-layer first dielectric layer 112 and a multi-layer first conductive circuit layer 114 are formed on the first surface 102 of the silicon wafer 100 by using a wafer-level semiconductor manufacturing process. The first dielectric layer 112 and the first conductive circuit layer 114 are laminated alternately to form the first circuit substrate 110 . Due to the adoption of wafer-level semiconductor manufacturing process, the wiring density of the first conductive circuit layer 114 can reach nanometer level (nanometer level). The first di...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a silicon based substrate, which comprises a silicon chip, a first line substrate and a second line substrate. The silicon chip is provided with a first surface and a second surface which face to each other and is provided with a through-silicon via. The first line substrate is arranged on the first surface and consists of a plurality of first dielectric layers and a plurality of first conductive line layers which are alternately laminated. The second line substrate is arranged on the second surface and consists of a plurality of second dielectric layers and a plurality of second conductive line layers which are alternately laminated. The through-silicon via is respectively and electrically connected with the first conductive line layer at the bottommost layer in the first line substrate and the second conductive line layer at the topmost layer in the second line substrate. The wiring density of the first conductive line layers is larger than the wiring density of the second conductive line layers, or the first dielectric layers comprise organic materials and the second dielectric layers comprise organic materials. The invention additionally discloses a fabrication method for the silicon based substrate.

Description

technical field [0001] The invention relates to a silicon-based substrate, and in particular to a silicon-based substrate with an asymmetric structure and a manufacturing method thereof. Background technique [0002] At present, the existing silicon based substrate is usually designed and manufactured according to the symmetrical design rule of the traditional circuit substrate, so it has a symmetrical structure. That is to say, the stacked circuit structure and the material of the dielectric layer on opposite sides of the silicon substrate of the conventional silicon-based substrate are substantially the same. [0003] Generally, in the actual use of silicon-based substrates in electronic products, the stacked circuit structure on one side of the silicon substrate is used for electrical connection with electronic components, and the stacked circuit structure on the other side is used for electrical connection with circuit boards during packaging. With the increasingly dive...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L23/498H01L23/485H01L21/48H01L21/60
CPCH01L2924/0002H01L2924/00
Inventor 郭建利郑瑞宏
Owner YIGFEBOS YOULE LLC