Optimization algorithm for quickly adjusting beam of large-angle ion implantation machine
An ion implanter, large-angle technology, applied in computing, special data processing applications, instruments, etc., to achieve the effects of avoiding time consumption, improving productivity, and quickly optimizing beam current
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0015] The present invention will be further described below in conjunction with the accompanying drawings.
[0016] see figure 1 , the large-angle ion implanter includes: a long-life gas-solid dual-purpose ion source 1, a source magnetic field magnet 2, a three-dimensional (X / Y / Z) automatic adjustment system 3, an extraction suppression electrode 4, a pre-analysis magnetic field magnet 5. A focusing electrode 6, an accelerating tube 7, an analysis field magnet 8, a variable rotation analysis slot 9, a symmetrical double-electrode scanning plate 10, a fixed Faraday cup 11, a parallel lens magnet 12, and an ion beam 13 . A target chamber wafer processing system 14 .
[0017] The long-life gas-solid dual-purpose ion source 1 utilizes the substances entering the cavity to generate a large amount of plasma required. A large amount of plasma is extracted with a certain energy and enters the three-dimensional (X / Y / Z) automatic adjustment system 3. After the automatic position adju...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com