2R1T three degree of freedom space flexible precision positioning platform

Abstract

The invention discloses a 2R1T three degree of freedom space flexible precision positioning platform, which is characterized by comprising, from up to bottom, a moving platform, a rigid end bracing frame, three rectangular branched chains, three piezoelectric ceramic driver and a rigid pedestal. The moving platform is in an inverted boss shape; the rigid end bracing frame is in an equilateral triangle shape; the three rectangular branched chains are in a same shape and structure, which comprises eight single degree of freedom flexible hinges arranged on an upper beam and a lower beam; the three rectangular branched chains are arranged along three edges of the triangle rigid pedestal; the three piezoelectric ceramic drivers are arranged horizontally between two vertical beams of each rectangular branched chain to form an H-shape structure; the rigid pedestal is in a hollow equilateral triangle structure; and the three rectangular branched chains are rigidly fixed on the rigid pedestal.

Description

technical field [0001] The invention relates to a micro-operating system in the mechanical field, in particular to a 2R1T three-degree-of-freedom space flexible precision positioning platform, which can be applied to an imprint photolithography system. Background technique [0002] Nanoimprint lithography is a brand-new nano-pattern replication method with obvious advantages and strong competitiveness, fundamentally showing broad prospects for the production of nano-devices. Therefore, at the end of 2003, it was planned by the International Semiconductor Blueprint Agency as a key technology for the next-generation 32nm node lithography process. [0003] Positioning platforms or stages have always been a critical part of traditional lithography systems. Existing precision positioning workbenches used in lithography systems mostly use air flotation systems, driven by linear stepping motors, such as Ji Junsheng’s "Precision Positioning Workbench Applied in X-ray Lithography Ma...

AI Technical Summary

Problems solved by technology

The driving speed of the precision positioning mechanism combined with the ball guide rail and the threaded screw driving mechanism is difficult to meet the speed requirements of the workbench of the photolithography system, and the application range is limited

However, the precision positioning system that uses a stepping motor driven by a friction mechanism and a ball guide rail to drive the worktable is difficult to overcome the disadvantages of intermittent motion, low-speed crawling and high-speed vibration, long time for mechanical stability establishment, and inability to achieve high motion positioning accuracy.

Lee Deug Woo et al., "A study on auto alignment system of Nano Imprint Lithography (NIL) process" (cf. Lee Deug Woo, Lee Chae Moon, Chee Dong Hwan. A study on auto alignment system of Nano Imprint Lithography (NIL) process .Proceedings of the 1st International Conference on Positioning Technology Japan: Hamamatsu, 2004.97~101) The hemispherical air bearing imprinting machine introduced in the paper uses the air flow valve to control the pressure, and realizes the parallelism adjustment of the wafer table through the hemispherical air bearing, and the cost is low , The structure is simple, but the adjustment accuracy needs to be improved

In addition, the new type of precision positioning system using piezoelectric ceramics and linear motor composite drive can effectively improve the positioning accuracy of nanoimprint equipment and reduce the system stabilization time, but the parallelism of end effectors in existing imprint equipment The degree adjustment adopts a passive method, that is, the self-adaptive adjustment of the position and posture of the wafer stage is realized through the elastic deformation of the material during the imprinting process, which limits the improvement of the imprinting accuracy and quality. For example, B.J.Choi et al. Design of orientation stage for step and flash imprintlithography" (B.J.Choi, S.V.Sreenivasan, S.Jonhson, M.Colburn, C.G.Wilson, Design of orientation stage for step and flash imprintlithography, Precision Engineering, 2001, 25(3): 192-199. ), Jae-Jong Lee et al., "Design and analysis of nanoimprint lithography equipment for fabricating 100nm linewidth features" (Jae-Jong Lee, Kee-BongChoi, Gee-Hong Kim, Design and analysis of the single- This type of equipment and related technologies are reported in step nanoimprintinglithography equipment for sub-100 nm linewidth, Current Applied Physics 2006, 6: 1007-1011.)

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