Production method of tri-axial accelerometer
A technology of shaft acceleration and manufacturing method, which is applied in the directions of multi-dimensional acceleration measurement, acceleration measurement using inertial force, and manufacture of microstructure devices, etc. The effect of the production process
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[0026] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0027] The invention provides a method for processing an acceleration sensor based on an SOI wafer as a substrate. Figure 1 to Figure 12 Shown is the manufacture method of triaxial accelerometer 10 of the present invention, and its specific operation steps are as follows:
[0028] A. If figure 1 As shown, an SOI (Siliconon Insulator, silicon on an insulating substrate) wafer is provided, and the SOI wafer includes a silicon substrate layer 11, an intermediate oxide layer 12 and a doped silicon top layer 13;
[0029] B. If figure 2 As shown, a groove 130 is etched in the doped silicon top layer 13 by using Deep Reactive Ion Etching (DREI, Deep Reactive Ion Etching), so that the groove 130 runs through the entire doped silicon top layer 13;
[0030] C. If image 3 As shown, a first protective layer 141 is deposited on the doped silicon top layer 13 ...
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