Printable etching paste for etching low-emissivity thin film as well as etching method and product thereof
An etching paste and low-radiation technology, which is applied in the field of etching coated glass and coated glass processing, can solve the problems of poor side etching effect, long etching time, and insufficient resistance of 1.0mm line width, so as to achieve good etching effect and raw material Simple, low-cost effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0037] Etching paste composition:
[0038] 20ml phosphoric acid (85%)
[0039] 3ml iodine (medical use)
[0040] 12g SiO 2 pink
[0041] 3ml deionized water
[0042] While stirring, add phosphoric acid, deionized water, and iodine into the beaker one after another, stir evenly, and then add SiO 2 powder, and stirred for 2h until a uniform etching medium was formed.
[0043] Using a 300-mesh screen with a line width of 1.0 mm, an etching paste was printed on the low-e glass of Example 1 described in Chinese Patent Application No. CN200910054331.2, which can be baked and bent, by screen printing. After printing, put the Low-e glass in an oven, and bake the film layer printed with etching paste at 250°C for 25 minutes. After the baking treatment, use water or weak alkaline water to clean the etching paste on the film layer; use ultrasonic, spray and other methods to achieve better cleaning effect. Finally, bake the etched Low-e glass to remove water marks on the film surfa...
Embodiment 2
[0046] Etching paste composition
[0047] 7ml sulfuric acid (30%)
[0048] 3ml iodine (medical use)
[0049] 6g SiO 2 pink
[0050] 5ml deionized water
[0051] While stirring, add sulfuric acid, iodine, and deionized water to the beaker one after another, stir evenly, and then add SiO 2 powder, and stirred for 2h until a uniform etching medium was formed.
[0052] Using a 300-mesh screen with a line width of 1.0mm, the etching paste was printed on the commercially available Fuyao Low-e glass by screen printing. After printing, put the Low-e glass in an oven, and bake the film layer printed with etching paste at 200°C for 20 minutes. After the baking treatment, use water or weak alkaline water to clean the etching paste on the film layer; use ultrasonic, spray and other methods to achieve better cleaning effect. Finally, bake the etched Low-e glass to remove water marks on the film surface.
[0053] Use a multimeter to test the resistance of the line width is greater t...
Embodiment 3
[0054] Embodiment 3 (comparative example 1)
[0055] Take the commercially available water-based environmental protection etching paste as an example (with acid as the main etching component)
[0056] Using a 300-mesh screen with a line width of 1.0 mm, an etching paste was printed on the low-e glass of Example 1 described in Chinese Patent Application No. CN200910054331.2, which can be baked and bent, by screen printing. After printing, put the Low-e glass into the oven to bake it. After the baking treatment, use water or weak alkaline water to clean the etching paste on the film layer; use ultrasonic, spray and other methods to achieve better cleaning effect. Finally, bake the etched Low-e glass to remove water marks on the film surface.
[0057] The resistance test results are shown in Table 1.
[0058] Table 1 Etching effect table of commercially available water-based environmental protection etching paste
[0059] Etching temperature
PUM
| Property | Measurement | Unit |
|---|---|---|
| electrical resistance | aaaaa | aaaaa |
| width | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More