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Microchip used for surface plasma resonance measurement and surface plasma resonance measuring device

A surface plasmon and resonance measurement technology, which is used in the measurement of scattering characteristics, phase influence characteristics, color/spectral characteristics, etc.

Inactive Publication Date: 2012-05-23
USHIO DENKI KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0036] However, in the past, when multiple measurements were performed using a single microchip, there was no research on how to arrange multiple flow channels and how to measure efficiently and in a short time.

Method used

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  • Microchip used for surface plasma resonance measurement and surface plasma resonance measuring device
  • Microchip used for surface plasma resonance measurement and surface plasma resonance measuring device
  • Microchip used for surface plasma resonance measurement and surface plasma resonance measuring device

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no. 2 Embodiment

[0206] Next, the following example will be described: by arranging the light-irradiated positions of the plurality of metal thin films of the microchip to be parallel to the side on which the protruding portion is provided, a point on the central line equidistant from the side is By rotating the microchip 180° around the point of point symmetry at the point symmetry point, the measured row and the unmeasured row are switched in the upper and lower stages, and multiple channels can be quickly measured.

[0207] exist Figure 12 The external view of the microchip of this embodiment is shown in Figure 13 A detailed diagram of each part of the microchip is shown in . Figure 13 (a) is a cross-sectional view of the microchip of this embodiment, showing Figure 13(c) C-C sectional view. Figure 13 (b) is Figure 13 A-A sectional view of (a), Figure 13 (c) is Figure 13 (a) B-B sectional view.

[0208] The microchip of this embodiment differs only in the number of channels, ...

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Abstract

The invention provides a microchip used for surface plasma resonance measurement. Even when deviation of the thickness of the substrate forming the microchip exists, error does not appear in a measuring result. And the measurement can be realized efficiently and in short time. In the microchip (10) connecting a first microchip substrate (11) having a groove with a second microchip substrate (12) having a metal film (13), projection parts (16) are formed in two side faces. One of the side faces is adopted as a plane the same with the joint face (LL) of the first microchip substrate and the second microchip substrate. An SPR sensor device is provided with a specimen fixing part (24) having a measuring reference face (L) arranged on a lower surface side. The projection part of the microchip is pressed on the measuring reference surface for keeping and fixing. Thus, the joint face is not influenced by the deviation of the second microchip substrate and is in correspondence with the measuring reference face. An arriving position of the reflecting light reflected by the metal film on the CCD light receiving face has no deviation.

Description

technical field [0001] The present invention relates to a microchip used for measuring a specimen held inside by using surface plasmon resonance, and a surface plasmon resonance measurement device for measuring a specimen held in the chip. Background technique [0002] Conventionally, various surface plasmon resonance measurement devices (hereinafter also referred to as SPR sensor devices) utilizing the surface plasmon resonance (Surface Plasmon Resonance, hereinafter also referred to as SPR) phenomenon have been proposed. [0003] The SPR phenomenon is due to the resonance of the plasmon wave called surface plasmon existing on the metal thin film and the evanescent wave generated on the metal surface when the light irradiated from the back of the metal thin film is totally reflected, at a certain angle (resonance angle) The phenomenon of attenuation of reflected light intensity. This resonance angle depends on the refractive index of the metal surface. [0004] Figure 17...

Claims

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Application Information

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IPC IPC(8): G01N21/55G01N21/27G01N21/41
Inventor 三浦真毅铃木信二森田金市
Owner USHIO DENKI KK