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Equipment and method for plating glass antireflective film through chemical vapor deposition process

A technology of chemical vapor deposition and anti-reflection coating, which is applied in the field of on-line coating of glass anti-reflection coating by chemical vapor deposition, which can solve the problems of thin edge thickness of cut-to-length glass, high glass waste rate, and large energy consumption. , to achieve the effect of reducing vacuum energy consumption, low energy consumption and reducing drying process

Inactive Publication Date: 2014-07-02
绥中滨海经济区红杉科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] The purpose of the present invention is to provide a low energy consumption, which can coat uniform Equipment and method for coating glass anti-reflection film by chemical vapor deposition method of glass anti-reflection film

Method used

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  • Equipment and method for plating glass antireflective film through chemical vapor deposition process
  • Equipment and method for plating glass antireflective film through chemical vapor deposition process
  • Equipment and method for plating glass antireflective film through chemical vapor deposition process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0089] The width of the glass ribbon is 2400mm, and the pulling speed of the glass ribbon is 280m / hr.

[0090] The prepared glass raw materials are melted and clarified to obtain a high-viscosity glass liquid at 1100°C, and the high-viscosity glass liquid is rolled and formed by a set of engraved alloy steel rollers with a water cooling device inside to obtain a high-temperature glass ribbon of the required thickness 18. The formed glass ribbon is rapidly cooled to 665°C on the inner water-cooled alloy steel roller, and coated with the equipment for coating glass anti-reflection film by chemical vapor deposition method. The main raw material of the anti-reflection film used is tetraethyl silicate Esters, deionized water and air, the dosage of tetraethyl silicate is 8.5Kg / hr; the dosage of deionized water is 0.5Kg / hr; the air flow rate is 58Kg / hr; triethyl phosphate is used as catalyst, and the dosage is 0.9Kg / hr ; Nitrogen is used as the carrier gas with a flow rate of 97Kg / h...

Embodiment 2

[0092] The width of the glass ribbon is 2400mm, the pulling speed is 255m / hr, the temperature of the glass ribbon in the coating area is 680°C, the anti-reflection chemical raw material mainly uses silicon tetrachloride, and the dosage is 12Kg / hr; the dosage of deionized water is 0.72Kg / hr; the catalyst phosphoric acid The amount of triethyl ester is 0.67Kg / hr; the air flow rate is 78Kg / hr; nitrogen is used as the carrier gas, the flow rate is 121Kg / hr, and the air directly enters the coating device nozzle 32 from the dry air supply device.

[0093] All the other are with embodiment 1.

Embodiment 3

[0095] The width of the glass ribbon is 2400mm, the pulling speed is 245m / hr, and the temperature of the glass ribbon in the coating area is 640°C. The raw material of the anti-reflection film is tetraethyl orthosilicate, the dosage is 7.6Kg / hr; the dosage of deionized water is 0.5Kg / hr; the dosage of catalyst triethyl phosphate is 0.7Kg / hr; the air flow rate is 70Kg / hr; The air is 89Kg / hr, and the air enters the cyclone tube 32 from the same direction as the raw material of the liquid-phase anti-reflection film enters.

[0096] All the other are with embodiment 1.

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Abstract

The present invention aims at the disadvantages in the prior art that the energy consumption is large when coating glass anti-reflection coatings, and the edge thickness of the cut-to-length glass is so thin that the rate of glass rejects is high, and provides a chemical vapor deposition method for coating glass anti-reflection coatings. The equipment and method, the equipment includes an anti-reflection film raw material supply device, an anti-reflection film liquid-phase raw material vaporization device provided with a vaporization chamber, a waste gas treatment device, a film coater provided with a nozzle and an exhaust gas passage, and a constant temperature device. The reflective film raw material supply device is communicated with the vaporization chamber pipe of the vaporization device, the vaporization chamber is communicated with the nozzle pipe of the film coater, and the exhaust gas channel is communicated with the waste gas treatment device pipe; the method of the present invention is After the glass is formed and before annealing, the glass anti-reflection film is plated. The glass anti-reflection film plated by the equipment and method has excellent film quality, low energy consumption and large production scale.

Description

technical field [0001] The present invention relates to the equipment and method for plating glass anti-reflection film by chemical vapor deposition method, in particular to the equipment and method for online plating glass anti-reflection film by chemical vapor deposition method. Background technique [0002] Anti-reflection coating is also called anti-reflection coating. Its main function is to reduce or eliminate the reflected light from optical surfaces such as lenses, prisms, plane mirrors, and glass, thereby increasing the light transmission of these components and reducing or eliminating stray light in the system. [0003] All types of solar cell components are inseparable from the upper light-receiving cover glass material, which is an ultra-white glass cover that covers the surface of the solar cell to allow sunlight to enter the photovoltaic cell to generate power semiconductor materials and protect the photovoltaic cell itself. As we all know, light waves will pro...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/00C03C17/245
Inventor 李西平杨振渤舒尊启杜震宇
Owner 绥中滨海经济区红杉科技有限公司
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