Method for high-sensitivity measurement of surface optical nonlinearity of material

Abstract

The invention discloses a method for high-sensitivity measurement of surface optical nonlinearity of a material, and belongs to the fields of nonlinear photonics materials and nonlinear optical information processing. According to the method, incident laser is divided into two paths through a beam splitter mirror, wherein one path of the incident laser serves as detecting light and enters a measuring optical path, a round small hole and a round baffle plate are arranged in an optical path reflected by the surface of a sample; and the other path of the incident laser serves as reference light. Under the action of a single pulse, nonlinear absorption and nonlinear refractive indexes of the material are determined by measuring nonlinear reflectivity of an opening and the combination of a far-field round small hole and the baffle plate. A measuring system which is operated according to the method has the advantages of simple optical path, very high measuring sensitivity, no movement of samples, single-pulse measurement and the like, and cannot easily damage a medium.

Description

technical field [0001] The invention relates to a method for measuring optical nonlinearity of materials, which belongs to the field of nonlinear photonic materials and nonlinear optical information processing. Background technique [0002] With the rapid development of technologies in the fields of optical communication and optical information processing, the research on nonlinear optical materials is becoming increasingly important. The realization of functions such as optical logic, optical memory, optical transistor, optical switch and phase complex conjugation mainly depends on the research progress of nonlinear optical materials. Optical nonlinear measurement technology is one of the key technologies for studying nonlinear optical materials. Commonly used measurement methods include Z-scan, 4f system coherent imaging technology, Mach-Zehnder interferometry, four-wave mixing, third harmonic nonlinear interferometry, ellipsometry, phase object Z-scan, etc. Among them, ...

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Problems solved by technology

However, this method is the same as the traditional 4f phase coherent imaging technology, and its measurement sensitivity may not meet the measurement requirements for the measurement of material surfaces and thin films with relatively low damage threshold light intensity

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