Curvature wavefront sensor based on digital micromirror device

A digital micromirror device and wavefront sensor technology, which is applied in the field of optical information measurement, can solve the problems of working wavelength sensitivity and light energy utilization rate reduction, and achieve the effects of avoiding additional aberration, fast modulation speed, and improving measurement accuracy

Inactive Publication Date: 2012-08-08
江苏明德之星激光显示科技有限公司
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However, the grating will cause a serious reduction in light

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  • Curvature wavefront sensor based on digital micromirror device
  • Curvature wavefront sensor based on digital micromirror device
  • Curvature wavefront sensor based on digital micromirror device

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[0017] In order to make the objectives, technical solutions and advantages of the present invention more clearly understood, the present invention will be further described in detail below with reference to specific embodiments and accompanying drawings.

[0018] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0019] The principle of the present invention: the curvature wavefront sensor technology requires the photodetector array to obtain the light intensity distribution images on the two symmetrical defocus planes before and after the lens focal plane, but when designing the actual realization device structure, the structure should be simple, The utilization rate of light energy is high, the synchronous or pseudo-synchronous detection of front and rear focal plane image detection, and the reliability of the system are guaranteed, and the detection speed and accuracy are not greatly affected. Digital Micromi...

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Abstract

The invention relates to a curvature wavefront sensor based on a digital micromirror device. A digital micromirror device is placed between a lens and the focal plane position of the lens, the digital micromirror device is utilized to reflect light wave passing through the lens in two directions to focus light wave, two photoelectric detector arrays are respectively located on two beams of reflection focus light wave in the two directions of the digital micromirror device and respectively detect far field light intensity distribution images of the two beams of reflection focus light wave at different places to obtain two far field light intensity distribution images which are different on a symmetrical out-of-focus face around a focal plane. Relation between light intensity distribution difference normalization of corresponding points on the two out-of-focus faces, incident wavefront curvature and normal curvature of wavefront at the edge of pupil can be obtained according to the fresnel diffraction theory and approximation in geometric optics, and the poisson equation can be utilized to obtain wavefront phase of wavefront to be measured.

Description

technical field [0001] The invention belongs to the technical field of optical information measurement, and relates to a device for acquiring wavefront information of an incident beam, in particular to a curvature wavefront sensor based on a digital micromirror device. Background technique [0002] The shear interferometer and the Hartmann wavefront sensor are the two most widely used wavefront sensors at present. Both of these two wavefront sensors measure the slope distribution of the wavefront, which needs to be reconstructed by a computer. The corresponding control signal of the wavefront corrector can only be generated after a series of relatively complex processing. Due to the rapid change of atmospheric turbulence, the adaptive optics system is required to have fast wavefront detection and feedback correction capabilities, and the complex data processing process does not Conducive to the improvement of adaptive system control bandwidth. Curvature sensor wavefront sen...

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Application Information

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IPC IPC(8): G01J9/00G02B26/08
Inventor 王帅杨平许冰
Owner 江苏明德之星激光显示科技有限公司
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