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246results about How to "Avoid frequency" patented technology

Plasma furnace disposal of hazardous wastes

A method and apparatus for plasma waste disposal of hazardous waste material, where the hazardous material is volatilized under vacuum inside a containment chamber to produce a pre-processed gas as input to a plasma furnace including a plasma-forming region in which a plasma-forming magnetic field is produced. The pre-processed gas is passed at low pressure and without circumvention through the plasma-forming region and is directly energized to an inductively coupled plasma state such that hazardous waste reactants included in the pre-processed gas are completely dissociated in transit through the plasma-forming region. Preferably, the plasma-forming region is shaped as a vacuum annulus and is dimensioned such that there is no bypass by which hazardous waste reactants in the pre-processed gas can circumvent the plasma-forming region. The plasma furnace is powered by a high frequency power supply outputting power at a fundamental frequency. The power supply contains parasitic power dissipation mechanisms to prevent non-fundamental, parasitic frequencies from destabilizing the fundamental frequency output power. These power loss mechanisms use either distributed resistance or frequency-selective power-loss devices to prevent parasitic oscillations from instantaneously turning on the high frequency power oscillator at non-fundamental frequencies.
Owner:RES TRIANGLE INST

Phase-shifted resonant converter having reduced output ripple

ActiveUS6970366B2Prevent frequency shiftPreventing overvoltage conditionConversion with intermediate conversion to dcEnergy industryResonant inverterPhase shifted
A power converter comprises a pair of resonant converter circuits coupled together in parallel and operated at respective switching frequencies that are out of phase. The power converter includes a first resonant converter circuit and a second resonant converter circuit operatively coupled together. The first resonant converter circuit includes at least one power switch adapted to convey power to a first resonant circuit and a first rectification stage adapted to rectify the conveyed power from the first resonant circuit. The second resonant converter circuit includes at least one power switch adapted to convey power to a second resonant circuit and a second rectification stage adapted to rectify the conveyed power from the second resonant circuit. A filter capacitor is coupled to the first and second rectification stages to provide DC output power therefrom. A regulator is operatively coupled to the first and second resonant converters to control switching frequency of the power switches, such that the switching frequency of the at least one power switch of the second resonant converter is shifted in phase with respect to the switching frequency of the at least one power switch of the second resonant converter. In a preferred embodiment, the switching frequency of the at least one power switch of the second resonant converter is shifted in phase by approximately 90° with respect to the switching frequency of the at least one power switch of the second resonant converter.
Owner:BEL POWER SOLUTIONS INC

Terahertz light source chip and manufacturing method thereof, terahertz light source device and manufacturing method thereof, and terahertz light source module and manufacturing method thereof

The invention provides a terahertz light source chip and a manufacturing method thereof, a terahertz light source device and a manufacturing method thereof, and a terahertz light source module and a manufacturing method thereof. The light source chip comprises a two-dimensional electron gas mesa, an electrode, a terahertz resonant cavity and an optical grating, wherein the electrode is formed on the two-dimensional electron gas mesa and used for exciting plasma waves; the terahertz resonant cavity is formed below the two-dimensional electron gas mesa, and a holophote is arranged on the bottom surface of the resonant cavity; the optical grating is formed on the two-dimensional electron gas mesa and used for coupling a plasma wave mode to a terahertz resonant cavity mode so that terahertz wave emission can be generated. Plasma polaritons are formed by strongly coupling the terahertz resonant cavity mode to the plasma wave mode in two-dimensional electron gas under the optical grating, terahertz wave emission can be generated through electric excitation of the plasma polaritons, the problem that terahertz emission is low in frequency or working temperature because of high frequency oscillation relaying on a single electron or quantum jump relaying on a single electron is solved, and the emission frequency range and the working temperature range are widened.
Owner:SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI

Device and method for detecting amount of bottom thread of sewing machine

The invention provides a device for detecting the amount of bottom thread of a sewing machine. The sewing machine comprises a bottom plate, a rotating shuttle and an electronic control module, wherein the rotating shuttle comprises a shuttle shell and a shuttle core; the shuttle core comprises a winding post and two flanges; at least one flange in the two flanges is provided with a first surface part and a second surface part on the outer surface; a light hole is formed on the outer wall of the shuttle shell; the first surface part or the second surface part is exposed outside from the light hole; the sewing machine also comprises a sensor fixed in the bottom plate; the sensor comprises a transmitter used for transmitting light, and a receiver used for receiving light; the receiver and the transmitter of the sensor just face to the first surface part or the second surface part exposed outside from the light hole, and the light reflection capabilities of the first surface part and the second surface part are different from each other; the sensor is connected with a signal processing module; the signal processing module is connected with the electronic control module. The device for detecting the amount of the bottom thread of the sewing machine is capable of timely detecting whether the bottom thread is used up or not in real time.
Owner:JACK SEWING MASCH CO LTD

Plasma furnace disposal of hazardous wastes

A method and apparatus for plasma waste disposal of hazardous waste material, where the hazardous material is volatilized under vacuum inside a containment chamber to produce a pre-processed gas as input to a plasma furnace including a plasma-forming region in which a plasma-forming magnetic field is produced. The pre-processed gas is passed at low pressure and without circumvention through the plasma-forming region and is directly energized to an inductively coupled plasma state such that hazardous waste reactants included in the pre-processed gas are completely dissociated in transit through the plasma-forming region. Preferably, the plasma-forming region is shaped as a vacuum annulus and is dimensioned such that there is no bypass by which hazardous waste reactants in the pre-processed gas can circumvent the plasma-forming region. The plasma furnace is powered by a high frequency power supply outputting power at a fundamental frequency. The power supply contains parasitic power dissipation mechanisms to prevent non-fundamental, parasitic frequencies from destabilizing the fundamental frequency output power. These power loss mechanisms use either distributed resistance or frequency-selective power-loss devices to prevent parasitic oscillations from instantaneously turning on the high frequency power oscillator at non-fundamental frequencies.
Owner:RES TRIANGLE INST

System for displaying graphics in a digital television receiver

A circuit for displaying graphics in a digital television receiver includes an MPEG decoder which has as input a video data stream in digital format, a central memory for storing decoded video data and graphics data, a video output unit and a graphics output unit to which video data and graphics data, respectively, are fed from the central memory, a mixer to which an output signal from the video output unit is fed, and a switch through which the output signal of the graphics output unit is selectively fed to the mixer. Horizontal and vertical synchronization signals from the MPEG decoder may be fed to the video output unit, while horizontal and vertical synchronization signals from various sources (including those from the MPEG decoder) may be selectively fed through a multiplexer to the graphics output unit. One buffer memory each may be placed before the video output unit and the graphics output unit, respectively, each memory unit buffering the corresponding data retrieved from the central memory. A signal generator may be provided which generates horizontal and vertical synchronization signals and provides these to the multiplexer. Additional horizontal and vertical synchronization signals may be fed to the multiplexer from an external connector. The video output unit may be operated at a first clock frequency, while the graphics output unit may be operated at a second clock frequency. This helps to achieve essentially independent processing of the graphics data and the video data. When the switch is closed, the first and second clock frequencies may be the same, and the same horizontal and vertical synchronization signals may then be sent to both the video output unit and the graphics output unit.
Owner:MICRONAS

Scanner for probe microscopy

ActiveUS20060112760A1Increase capacitive loadingMechanical resonance frequency be lowNanotechnologyScanning probe microscopyStrain gaugeMicroscope
A scanner for probe microscopy that avoids low resonance frequencies and accounts better for piezo nonlinearities. The x, y and z axes of a linear stack scanner are partially decoupled from each other while maintaining all mechanical joints stiff in the direction of actuation. The scanning probe microscope comprises a probe, a housing, at least two actuators, each coupled to the housing, and a support coupled to the housing and to at least a first of the actuators at a position spaced from the point at which the actuator is coupled to the housing. The support constrains the motion of the first actuator along a first axis while permitting translation along a second axis. The actuators are preferably orthogonally arranged linear stacks of flat piezos, preferably in push-pull configuration. The support can take different forms in different embodiments of the invention. In a particular embodiment, the scanner is a 2D scanner having a support frame with x and y axes, and a member for supporting an object to be moved such as a sample for a probe, the scanner comprising a flexure and flexure coupled cross-conformed piezos arranged along x and y axes. Expansion of the piezos is measured by at least two strain gauges disposed to measure the differential motion of at least two opposed actuators. The strain gauges are preferably arranged to compensate for ambient temperature changes, and preferably two or more strain gauges of identical type are disposed on each actuator to magnify the strain signal.
Owner:RGT UNIV OF CALIFORNIA
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