Display device and array substrate as well as thin film transistor and manufacturing method thereof
A technology of thin film transistors and manufacturing methods, which is applied in the field of display devices, can solve problems such as damaging device stability and affecting product yield, and achieve the effects of improving yield, shortening process time, and avoiding impact
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Example Embodiment
[0133] Example 1
[0134] Such as image 3 As shown, as an embodiment of the present invention, the thin film transistor provided by the embodiment of the present invention is a thin film transistor structure with a gate layer at the bottom layer. Specifically, the thin film transistor includes: a gate 302a on the substrate 301, a gate insulating layer and an active layer 306a on the gate 302a, respectively. Wherein, the active layer 306a is an oxide semiconductor, the gate 302a is copper or copper alloy, the gate insulating layer is a single-layer structure, and includes a first gate insulating layer 303, and the first gate insulating layer 303 is silicon dioxide Thin film, silicon nitride thin film, silicon oxynitride thin film, aluminum oxide thin film or titanium oxide thin film. The thickness of the first gate insulating layer 303 is 50 nm to 500 nm.
[0135] In the embodiment of the present invention, the first gate insulating layer 303 may not only use a silicon dioxide fi...
Example Embodiment
[0156] Example 2
[0157] The difference between this embodiment and the first embodiment is that the thin film transistor provided by the embodiment of the present invention is a thin film transistor with a gate layer on the top layer. Specifically, the thin film transistor includes: an active layer located on a substrate, a gate insulating layer located above the active layer, and a gate located above the gate insulating layer. The specific structure and manufacturing method of the gate insulating layer are the same as the structure and manufacturing method of the gate insulating layer in Embodiment 1, and will not be repeated here.
Example Embodiment
[0158] Example 3
[0159] Such as Figure 5 As shown, the thin film transistor provided by the embodiment of the present invention is a thin film transistor structure with a gate layer at the bottom layer. Specifically, the thin film transistor includes a gate 312a on a substrate 311, a gate insulating layer and an active layer 316a on the gate 312a, respectively. Wherein, the active layer is an oxide semiconductor, the gate 312a is copper or copper alloy, the gate insulating layer is two layers, including a first gate insulating layer 313 and a second gate insulating layer 314, the first gate insulating layer The 313 layer is close to the gate 312a and above the gate. The second gate insulating layer 301 is close to the active layer 316a. The first gate insulating layer 313 is a silicon nitride film or a silicon oxynitride film, and the second gate The insulating layer 314 is silicon oxide, yttrium trioxide, or silicon oxynitride. Preferably, the thickness of the first gate in...
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