Array base board as well as manufacturing method and display device thereof
A manufacturing method and array substrate technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve problems such as long manufacturing time, high manufacturing cost, and complicated process, so as to improve production efficiency and reduce production cost , The effect of shortening the production time
Inactive Publication Date: 2015-04-29
BOE TECH GRP CO LTD
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Problems solved by technology
[0003] In the manufacturing process of thin film transistors, in some cases, in order to prevent over-etching of the active layer when forming the source and drain electrodes, it is necessary to deposit an etch stop layer on the active layer, which requires an additional photolithography process to form an etch barrier layer. For example, for bottom-gate TFTs, five patterning processes are generally required to complete the manufacture. The process is complex, the manufacturing time is long, and the manufacturing cost is also high.
[0004] In addition, the size of liquid crystal displays is increasing, and the frequency of driving circuits is increasing. Since the mobility of amorphous silicon thin film transistors is generally within 0.5cm 2 / VS is about, and when the size of the liquid crystal display exceeds 80in, the driving frequency exceeds 120Hz, and it needs 1cm 2 Mobility above / VS, the mobility of existing amorphous silicon thin film transistors is difficult to meet the demand
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[0034] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
[0035] figure 1 It is a cross-sectional view of an array substrate according to an embodiment of the present invention, referring to figure 1 , the array substrate includes:
[0036] The first layer of pixel electrodes 2, gate lines (not shown in the figure) and gate electrodes 3 formed on the substrate 1;
[0037] A gate insulating layer 4 formed on the first layer of pixel electrodes 2, gate lines and gate electrodes 3;
[0038] an active layer 5 and a protection layer 6 formed on the gate insulating layer 4, and a barrier layer 7 formed above the channel region of the active layer 5;
[0039] Source-drain electrodes 9 and data lines (not shown in the figure) are formed on the active layer 5 , and second-layer pixel electrodes 8 are formed on t...
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The invention provides an array base board as well as a manufacturing method and a display device thereof, the manufacturing method comprises that transparent conductive film and grid metal film are formed on the base board, and a first pattern layer of a pixel electrode, a grid wire and a grid electrode is formed through a composition process; a grid insulation layer and an active layer are formed, and patterns of the active layer are formed through the composition process; an insulation layer is formed, patterns of a protective layer and a stop layer are formed through the composition process, and the stop layer is arranged on a channel zone of the active layer; and the transparent conductive film and source-drain metal film is formed, and a second pattern layer of the pixel electrode, a source-drain electrode and a data wire is formed through the composition process. By the adoption of four composition processes provide by the invention, the manufacture of the array base board is realized, the manufacture time can be shortened, the production efficiency is increased, and the production cost is lowered.
Description
technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a manufacturing method thereof, and a display device. Background technique [0002] The flat panel display is currently a mainstream display, which includes an active matrix organic light emitting diode display (AMOLED), a thin film transistor liquid crystal display (TFT-LCD), and the like. TFT-LCD has the characteristics of small size, low power consumption, and no radiation, etc., and occupies a dominant position in the current flat panel display market. According to the direction of the electric field driving the liquid crystal, the TFT-LCD is divided into a vertical electric field type and a horizontal electric field type. The vertical electric field type includes twisted nematic (TN) TFT-LCD, and the horizontal electric field type includes fringe field effect (FFS) TFT-LCD and in-plane field effect (IPS) TFT-LCD. FFS-type TFT-LCD has the advant...
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IPC IPC(8): H01L21/77H01L27/12
Inventor 宁策于航李明超
Owner BOE TECH GRP CO LTD