Solar battery with superlattices and manufacturing method thereof
A solar cell and superlattice technology, applied in the field of solar cells, can solve the problems of affecting cell performance, reducing minority carrier lifetime, strain and composition fluctuation, etc., and achieve the effect of easily modulating the size of the band gap
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no. 1 Embodiment approach
[0033] The present invention provides a dilute nitrogen nitride (Dilute Nitride) superlattice solar cell with a superlattice structure.
[0034] The dilute nitride nitride superlattice solar cell with a superlattice structure has a bandgap range of 0.8eV to 1.4eV, includes a substrate layer 201 of Ge or GaAs, and includes a substrate layer of Ge or GaAs GaAs buffer layer 202, GaAs battery, GaAs contact layer 209 and upper contact electrode 210 are sequentially arranged on 201, and lower contact electrode 200 is included on the exposed surface of Ge or GaAs substrate layer 201.
[0035] The GaAs battery includes an AlGaAs back field layer 203, a first GaAs layer 204, an active region 211, a second GaAs layer 207 and an AlGaAs window layer 208 arranged in sequence on the GaAs buffer layer 202 in a direction away from the substrate layer 201, wherein the first GaAs The conductivity doping type of the layer 204 is opposite to that of the second GaAs layer 207 . The conductive dop...
no. 2 Embodiment approach
[0040] The preparation method of the above-mentioned solar cell with superlattice structure is:
[0041] 1) Using metal organic chemical vapor deposition (MOCVD) or molecular beam epitaxy (MBE) to sequentially grow a GaAs buffer layer 202, an AlGaAs back field layer 203 and a first GaAs layer 204 on a Ge or GaAs substrate layer 201;
[0042] 2) Two GaNAs / InGaAs short-period superlattice active regions 211 with different well layer thicknesses are grown on the exposed surface of the first GaAs layer 204 by MOCVD or MBE;
[0043]3) On the exposed surface of the superlattice active region 211, the GaAs emission layer 207, the AlGaAs window layer 208 and the GaAs contact layer 209 are epitaxially grown by MOCVD or MBE technology;
[0044] 4) Fabricate an N-type upper contact electrode 210 and a P-type lower contact electrode 200 on the exposed surface of the GaAs contact layer 209 and on the exposed surface of the Ge or GaAs substrate layer 201 .
[0045] An example of the presen...
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