Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same

一种固体摄像元件、感光性树脂的技术，应用在滤光片、光学元件、光学等方向，能够解决感光度及分辨率降低、染料耐热性、耐光性差、不能固化等问题，达到线特性优异、分辨率高的效果

Inactive Publication Date: 2012-11-07
DONGWOO FINE CHEM CO LTD
View PDF2 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, dyes are poor in heat resistance, light resistance, etc., causing problems in terms of reliability
In addition, it can be said that the pattern size achievable with the wavelength 463-365nm of the light source used in the conventional process for forming colored patterns has reached the limit resolution.
[0006] Accordingly, the inventors of the present invention conducted research on ultra-miniaturizing the size of the coloring pattern of a color filter for a solid-state imaging device using an exposure device with an ultrashort wavelength of 300 nm or less. There is a problem that it cannot be cured well under the condition of ultra-short wavelength
In addition, even if it is cured under the condition of an ultra-short wavelength below 300nm, there is a problem that the sensitivity and resolution will decrease.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same
  • Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same
  • Colored photosensitive resin composition for preparation of color filter of solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, color filter using same, and solid-state image sensing device containing same

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0133] The preparation method of the color filter of the present invention comprises a coating film forming step, an exposing step, and a developing step. In the coating film forming step, the colored photosensitive resin composition of the present invention is coated on a substrate to form a coating film; in the exposing step, a mask is used to form the coating film with an ultra-short wavelength The area with the colored pattern is irradiated with ultra-short wavelength laser below 300nm, and exposed; the developing step removes the unexposed coating film area in the exposing step to form the colored pattern.

[0134] The coating film forming step is to apply the colored photosensitive resin composition on the substrate to form a coating film, and the substrate can be a glass plate, a silicon wafer, and polyethersulfone (PES) or polycarbonate (Polycarbonate). , PC) and other plastic-based boards, etc., the type is not particularly limited.

[0135] The coating can be carrie...

Embodiment 1

[0154] Based on 100% of the total solid content of the photosensitive resin composition except the solvent, a pulverized material consisting of 28.5% of colorant C.I. Pigment Red 254, 9.5% of colorant C.I. Pigment Yellow 139, and 6.44% of polyester dispersant , to 25.15.% binder resin (weight-average molecular weight 22000, acid value 80mgKOH / g, methacrylic acid and benzyl methacrylate copolymer), 12.58% photopolymerizable compound (dipentaerythritol hexaacrylate (KAYARAD DPHA; Nippon Kayaku (Co., Ltd.))) and 12.58% pentaerythritol triacrylate (Weiyuan Trading Company (Co., Ltd.)), 5% photoinitiator 1-hydroxycyclohexyl phenyl ketone (Irgacure 184; Ciba Fine Chemicals ( Ciba specialty Chemical) company), 0.25% adhesion promoter 2-(3,4-epoxycyclohexyl)-ethyltrimethoxysilane, add solvent propylene glycol methyl ether acetate (so that the weight ratio of solid content: solvent 2:8), and mixed with the above pulverized material under stirring at 23°C to obtain a colored photosensit...

Embodiment 2～4

[0156] A photosensitive resin composition was prepared in the same manner as in Example 1 except that the contents of each component were shown in Table 1.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
acid valueaaaaaaaaaa
particle diameteraaaaaaaaaa
acid valueaaaaaaaaaa
Login to View More

Abstract

The present invention relates to a colored photosensitive resin composition comprising a colorant, a binder resin, a photopolymerizable compound, a photopolymerization initiator and a solvent, and provides a colored photosensitive resin composition for the preparation of a color filter of a solid-state image sensing device using 300 nm or less ultrashort wave exposure equipment, wherein the photopolymerization initiator comprises a compound reacting at 300 nm or less. A color filter having ultrafine colored patterns can be prepared by using the colored photosensitive resin composition. Therefore, the color filter can be usefully applied to a solid-state image sensing device.

Description

technical field [0001] The present invention relates to a colored photosensitive resin composition for producing a color filter of a solid-state imaging element using an ultrashort wavelength exposure device of 300 nm or less, a color filter using the same, and a solid-state imaging element including the color filter . Background technique [0002] It is known that an imaging element for realizing a color image has a color filter above a photosensitive portion that receives light incident from the outside to generate and accumulate photocharges. The color filter is composed of three colored patterns of red (Red), green (Green) and blue (Blue), or is composed of yellow (Yellow), magenta (Magenta) and cyan (Cyan). Coloring pattern composition of three colors. [0003] The respective colored patterns of the color filters are formed using a colored photosensitive resin composition containing a pigment or a dye. The processing of the colored pattern using the colored photosens...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/028G03F7/031G02B5/20
CPCG03F7/0007G02B5/223G03F7/031G02B5/201
Inventor 李相行李昇鲁温晶勳全智民
Owner DONGWOO FINE CHEM CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com