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Method for preparing Ir layer on Pt matrix in chloride fused salt system through electrolytic deposition

A technology of electrodeposition and chloride, applied in the field of electrodeposition preparation, can solve the problems such as no Ir layer is seen, and achieve the effect of convenient operation and excellent performance

Inactive Publication Date: 2012-11-14
BEIHANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there is no literature report on the preparation of Ir layer by electrodeposition using molten salt technology in China.

Method used

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  • Method for preparing Ir layer on Pt matrix in chloride fused salt system through electrolytic deposition
  • Method for preparing Ir layer on Pt matrix in chloride fused salt system through electrolytic deposition
  • Method for preparing Ir layer on Pt matrix in chloride fused salt system through electrolytic deposition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] Step 1: Prepare electrodeposition solution

[0054] Step 101: Mix sodium chloride NaCl (analytical pure) and potassium chloride KCl (analytical pure) weighed in a molar ratio of 1:1 to obtain a mixture, then add the mixture into the electrolytic cell 7, and then Seal the electrolytic cell 7;

[0055] Step 102: Vacuumize the electrolytic cell 7 through the vacuum port 21, so that the vacuum degree in the electrolytic cell 7 reaches 3×10 -5 Pa;

[0056] Step 103: Adjust the well-type resistance furnace 5, and raise the temperature to 300°C at a heating rate of 7°C / min. After dehydration at 300°C for 2 hours, fill the electrolytic cell 7 through the argon gas port 22 while vacuuming. Argon (the mass percent concentration of high-purity argon is 99.99%);

[0057] Step 104: After continuing to heat up to the working temperature of 840°C, add iridium trichloride IrCl into the electrolytic cell 7 through the feeding port 23 3 , keeping the working temperature at 840°C for ...

Embodiment 2

[0075] Step 1: Prepare electrodeposition solution

[0076] Step 101: Mix sodium chloride NaCl (analytical pure) and potassium chloride KCl (analytical pure) weighed in a molar ratio of 1:1 to obtain a mixture, then add the mixture into the electrolytic cell 7, and then Seal the electrolytic cell 7;

[0077] Step 102: Vacuumize the electrolytic cell 7 through the vacuum port 21, so that the vacuum degree in the electrolytic cell 7 reaches 2×10 -5 Pa;

[0078] Step 103: Adjust the well-type resistance furnace 5, and raise the temperature to 300°C at a heating rate of 4°C / min. After dehydration at 300°C for 5 hours, fill the electrolytic cell 7 through the argon gas port 22 while vacuuming. Argon (the mass percent concentration of high-purity argon is 99.99%);

[0079] Step 104: After continuing to heat up to the working temperature of 790°C, add iridium trifluoride IrF in the electrolytic cell 7 through the feeding port 23 3 , keeping the working temperature at 790°C for 5 m...

Embodiment 3

[0098] Step 1: Prepare electrodeposition solution

[0099] Step 101: mix sodium chloride NaCl (analytical pure) and potassium chloride KCl (analytical pure) weighed in a molar ratio of 1:1 to obtain a mixture, then add the mixture into the electrolytic cell 7, and then Seal the electrolytic cell 7;

[0100] Step 102: vacuumize the electrolytic cell 7 through the vacuum port 21, so that the vacuum degree in the electrolytic cell 7 reaches 4×10 -5 Pa;

[0101] Step 103: Adjust the well-type resistance furnace 5, and raise the temperature to 300°C at a heating rate of 10°C / min. After dehydration at 300°C for 3.5 hours, fill the electrolytic cell 7 through the argon gas port 22 while vacuuming. Argon (the mass percent concentration of high-purity argon is 99.99%);

[0102] Step 104: After continuing to heat up to the working temperature of 890°C, add iridium tribromide IrBr into the electrolytic cell 7 through the feeding port 23 3 , keeping the working temperature at 890°C fo...

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Abstract

The invention discloses a method for preparing Ir layer on Pt matrix in a chloride fused salt system through electrolytic deposition. The method comprises the steps: depositing an Ir layer in the chloride fused salt system by setting different electrolytic deposition parameters, wherein a constant current mode is adopted in the electrolytic deposition; and mixing sodium chloride and potassium chloride at a molar ratio of 1:1 under high-temperature environment to obtain a mixture, and adding Ir salt at high temperature to form electrolytic deposition liquid. With the method, the Ir layer prepared on the Pt matrix in the chloride fused salt system through electrolytic deposition has the advantages of being convenient to operate, excellent in performance, suitable for deposition on parts with complicated shapes and the like.

Description

technical field [0001] The invention relates to an electrodeposition preparation method, more particularly, refers to a method for preparing an iridium (Ir) layer by electrodeposition on a platinum (Pt) substrate by using a constant current method in a chloride molten salt system. Background technique [0002] The melting point of metal iridium (Ir) is as high as 2400°C, and its chemical inertness is very strong. It can maintain a very low oxygen consumption rate below 2100°C, and it is difficult to react with carbon below the eutectic point of 2280°C. It is insoluble in all Inorganic acid can resist the erosion of many molten reagents and high-temperature silicates, which are not available in other metals. Due to the excellent anti-oxidation and corrosion resistance of Ir at high temperature, Ir is often deposited on the surface of key parts that require high temperature resistance, such as the inner wall of rocket combustion, turbine engine, thermal power generator, automo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D3/66
Inventor 钱建刚赵天
Owner BEIHANG UNIV