A color filter substrate

Abstract

The invention provides a CF (Color Filter) substrate, which can effectively reduce an oblique color cast phenomenon under the condition that the high resolution and the high color saturation are met. The CF substrate is provided with a plurality of color light resistors, wherein two adjacent color light resistors are in mutual contact, the color light resistors are all designed to be arc shapes, i.e. the upper surfaces of the color light resistors are of the arc shapes, a black matrix is positioned between two adjacent color light resistors, covers a part of the color light resistor and is positioned above edge parts of the color light resistors. When the CF substrate is manufactured, a plurality of the color light resistors can be formed on a substrate first, the black matrix can be then formed between the color light resistors and above the edge parts of the color light resistors, and then, a flat layer can be formed on the color light resistors and the black matrix.

Description

【Technical field】 [0001] The invention relates to a color filter substrate, in particular to a thin color filter substrate capable of effectively reducing oblique color shift phenomenon under the condition of high resolution and high color saturation. 【Background technique】 [0002] Color filter substrates are widely used in display devices. In the general process of color filter substrates, firstly, a black matrix is ​​set on the substrate, and then a plurality of color photoresists are set on the black matrix and the substrate, and then the colored light A flat layer is provided on the resistive upper layer. Among them, there are three kinds of color photoresists, which can pass through three different colors of light, such as red, green, and blue light. Among them, the black matrix is ​​located between adjacent color photoresists, which mainly plays the role of blocking stray light and preventing color mixing. [0003] Such as figure 1 Shown is a cross-sectional view o...

AI Technical Summary

Problems solved by technology

At present, the color saturation of the display panel can be improved by increasing the film thickness of the color photoresist, but the larger the film thickness of the color photoresist, the more prone to oblique color shift

In this way, even though the high film thickness of the color photoresist can improve the color saturation, it is still impossible to design the high film thickness of the color photoresist

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