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76results about How to "High resolution requirements" patented technology

Display device, preparation method thereof and display device

The invention relates to a display device, a preparation method thereof and a display device. The display device comprises a TFT array substrate; a light-emitting structure which is arranged on the TFT array substrate and comprises a pixel bank, a pixel isolation column and a plurality of pixel units, wherein the height of the pixel bank is larger than that of the pixel isolation column, the pixelbank defines a plurality of pixel grooves in the TFT array substrate, the pixel isolation columns are located in the pixel grooves and divide the pixel grooves into at least two sub-pixel grooves, asub-pixel is formed in each sub-pixel groove, and the colors of the sub-pixels located in the same pixel groove are the same; a scattering layer which is arranged on the light-emitting side of the light-emitting structure and comprises a first black isolation wall and a plurality of scattering units separated by the first black isolation wall, wherein the scattering units and the pixel units are arranged in a one-to-one correspondence mode, and the first black isolation wall and the pixel isolation columns are arranged in a one-to-one correspondence mode. The display device can improve the light extraction efficiency and improve the display effect of a high-resolution display.
Owner:GUANGDONG JUHUA PRINTING DISPLAY TECH CO LTD

Common-path radial cutting liquid crystal phase shift interference wave-front sensor

The invention discloses a common-path radial cutting liquid crystal phase shift interference wave-front sensor. The common-path radial cutting liquid crystal phase shift interference wave-front sensor is composed of a polarizer, a radial cutting system, an LC (Liquid Crystal Phase Modulator), a polarization analyzer, an imaging system and a computer. After a light beam to be detected enters into the wave-front sensor, the polarizer can be rotated, and the polarization direction of the incident light beam can be adjusted; then, two bundles of cutting light beams are formed after the incident light beam passes through the radial cutting system, the two bundles of the cutting light beams share the same light axis, the polarization directions of the two bundles of the cutting light beams are orthogonal, and the apertures of the two bundles of the cutting light beams are zoomed according to the same proportion; the two bundles of the cutting light beams can be directly irradiated to the LC, and the polarization directions of the LC and the enlarged light beams are kept the same; the computer drives the LC to introduce into N (N is larger than or equal to 3) different phase shifts between the cutting light beams, a polarized component, of which the polarization direction is consistent with that of the polarization analyzer, is obtained in the two bundles of the cutting light beams after passing through the polarization analyzer, and interference is generated; interference images are collected by the imaging system and are sequentially input into the computer in a time-division way, and the wave-front phase of the light beam to be detected can be reconstructed by analyzing and calculating. The common-path radial cutting liquid crystal phase shift interference wave-front sensor disclosed by the invention has the advantages that the structure of an optical system is simple, the impact of environmental vibration and non-common-path error can be restrained, the visibility of interference fringes is continuous and adjustable, and the wave-front detection accuracy is high.
Owner:INNER MONGOLIA UNIV OF TECH

Virtual image distance measuring system and virtual image distance measuring determining method

ActiveCN108362479AMeet the detection and calibration needsThe method of determining the virtual image distance is simpleTesting optical propertiesOptical axisDisplay device
The invention provides a virtual image distance measuring system and a virtual image distance measuring determining method. The system includes a photographing device, a reference object, and a measuring device. The photographing device is configured to focus a virtual object in a preset mode when being at a first photographing position so that the virtual object is clearly imaged in the photographing device. The reference object is configured, when the photographing device is in a second photographing position and in a focusing state, to move along the optical axis until clearly imaged in thephotographing device. The measuring device is configured to calibrate the distance between the reference object and the photographing device when the reference object is clearly imaged in the photographing device, wherein the distance is the virtual image distance of the virtual object. The method for determining the virtual image distance is simple and easy to operate, and can meet the detectionand correction requirements of display devices such as a virtual reality device and an augmented reality device, and solves a problem that equipment is highly required for determining the virtual image distance in the prior art.
Owner:BOE TECH GRP CO LTD +1

Automatic tattooing machine and automatic tattooing method

An automatic tattooing machine mainly comprises a support, a vertical linear motor, a horizontal linear motor, a pushing linear motor, a first swing motor, a second swing motor, a tattooing pen and a photoelectric detector. The first swing motor and the second swing motor are conveyed to specified positions through the vertical linear motor, the horizontal linear motor and the pushing linear motor. The orientation of the tattooing pen can be adjusted through the first swing motor and the second swing motor. The photoelectric detector is used for detecting patterns on drawing paper which is attached to the body of a person to be tattooed, and a control system is used for controlling the movement of all the motors to achieve tracking of the patterns. An automatic tattooing method includes the following steps that the patterns are printed on the drawing paper; the drawing paper is attached to the position to be tattooed of the person to be tattooed; the photoelectric detector detects the patterns on the drawing paper, and the tattooing pen is made to track lines with the patterns all the time; the tattooing pen is started, and tattooing begins. By means of the automatic tattooing machine and the automatic tattooing method, the problems that manual tattooing time is long and the requirement for operators is high are solved.
Owner:宫秀伟

Non-common-optical-path loop radial shear polarization phase shift interferometer

The invention provides a non-common-optical-path loop radial shear polarization phase shift interferometer which is formed by a polarization modulation system, a loop radial shearing system, an N-step phase shifting system and an imaging system. A detected wave moves forward to enter into the polarization modulation system to be linearly polarized light which goes through the loop radial shearing system to be two beams of widened and narrowed orthogonal polarized light, then the light is processed by the N-step phase shifting system to be two round polarized light with opposite rotation directions, an interference phenomenon is generated through the polarization analyzer, the imaging system collects N interference fringe patterns, a corresponding phase shift algorithm is used to reconstruct the phase distribution shearing wave-front, and an iterative method or Zernike polynomial fitting is used to separate detected wave-front from the shearing wave-front. According to the non-common-optical-path loop radial shear polarization phase shift interferometer, a special reference mirror is not needed, a non-common-optical-path structure is used to reduce the difficulty of alignment, thus the measurement is more simple and convenient, the N-step phase shift technology is used to recover the wave-front, and the data processing speed and arithmetic accuracy of phase extraction are improved.
Owner:SICHUAN UNIV

Manufacturing method of quantum dot color filter and display panel

The invention discloses a manufacturing method of a quantum dot color filter and a display panel. The manufacturing method of the quantum dot color filter comprises the following steps: manufacturing a first substrate, wherein the first substrate comprises a first substrate, and a surface treatment film and a quantum dot film which are sequentially arranged on the first substrate; manufacturing a second substrate, wherein the second substrate comprises a second substrate and a color resistance layer arranged on the second substrate; arranging the first substrate and the second substrate oppositely, and enabling the quantum dot film to be in contact with the color resistance layer; and stripping the second substrate from the first substrate, and enabling the quantum dot film in contact with the color resistance layer to be transferred to the color resistance layer, wherein the stripping force between the quantum dot film and the color resistance layer is greater than the stripping force between the quantum dot film and the surface treatment film. The quantum dot color filter with high energy efficiency, high resolution and high contrast can be obtained, and mass production of the display panel containing the quantum dot color filter can be realized.
Owner:SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD

Display panel and preparation method thereof

The invention provides a display panel and a preparation method thereof. The display panel comprises a substrate, a shading layer arranged on the substrate, a buffer layer covering the shading layer,an active layer arranged on the buffer layer, a gate insulating layer, a gate metal layer, an interlayer dielectric layer and a second metal layer arranged on the interlayer dielectric layer, whereinthe gate insulating layer and the gate metal layer are stacked on the active layer, the interlayer dielectric layer is arranged on the buffer layer and covers the gate metal layer; the active layer comprises an active island, the active island comprises a conductor layer and a semiconductor layer which corresponds to and is in contact with the gate insulating layer, and the conductor layer is provided with a protective layer. The aluminum oxide protective layer with a compact structure is generated on the surface of the conductor layer by utilizing a mutual diffusion effect of aluminum atoms and oxygen atoms in the indium gallium zinc oxide, so that the conductor layer after conductor formation is protected, and the conductor layer is prevented from being influenced by the subsequent manufacturing process; and meanwhile, the aluminum oxide has the characteristic of high resistance, so that the capacitance per unit area of the storage capacitor can be effectively improved, and the requirement of high resolution is met.
Owner:SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD

Geometric figure simplification method for BIM model

PendingCN110675508ASmooth browsing and managementHigh resolution requirementsImage data processingTriacontagonEngineering
The invention discloses a geometric figure simplification method for a BIM model. The geometric figure simplification method comprises the following steps: 1, acquiring surface geometric data of a BIMmodel body; 2, judging whether a certain grid surface of the BIM model is a triangular surface or not; judging whether the grid is a triangular patch or not according to the number of vertexes of a certain grid of the BIM model; when the polygon is a triangular surface, carrying out triangular patch merging simplification on the polygon, and then carrying out boundary line simplification on the merged polygon by adopting a three-point method; 3, according to a short edge principle, moving a point deleted after simplifying the boundary line of the polygon to the other vertex of the short edgein the adjacent edges; and 4, according to the obtained material information, endowing the simplified model with corresponding material attributes according to grid division. According to the geometric figure simplification method, simplification of triangular patches and boundaries of geometric data of the BIM model can be quickly realized; and by judging the shapes after combination, the advantages of the original geometric figure characteristics of the BIM model can be reserved.
Owner:CHANGJIANG SURVEY PLANNING DESIGN & RES +1

Display device, method for manufacturing display device, and display unit

The present invention relates to a display device, a method for manufacturing the display device, and a display unit. The display device includes: a TFT array substrate; a light-emitting layer disposed on the TFT array substrate and including a plurality of pixel units; and a scattering layer disposed between the TFT array substrate and the light-emitting layer and including a light-blocking separating wall and a plurality of scattering units separated by the light-blocking separating wall, wherein the scattering units and the pixel units correspond to each other one to one. The display device, by means of the scattering layer arranged between the substrate and the light-emitting layer and having scattering units corresponding to the pixel units of the light-emitting layer one to one, canprevent a light loss in a waveguide mode and improve light-emitting efficiency. In addition, the light-blocking separating wall can prevent crosstalk caused by the scattered light between adjacent pixel units and avoid a fuzzy phenomenon. The scattering layer can also improve an image quality loss caused by the uneven arrangement of factor pixels, and achieves the display effect of a high-resolution display, thereby satisfying a requirement for high resolution.
Owner:GUANGDONG JUHUA PRINTING DISPLAY TECH CO LTD
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