Manganese-chromium-doped zinc tungstate luminescent material and preparation method and application thereof
A luminescent material, co-doping technology, applied in luminescent materials, electroluminescent light sources, chemical instruments and methods, etc.
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[0021] The preparation method of the above-mentioned manganese-chromium co-doped zinc tungstate luminescent material comprises the following steps:
[0022] Step S11, according to ZnWO 4 :xMn 4+ , yCr 3+ The stoichiometric ratio of each element weighs ZnO, WO 3 , MnO 2 and Cr 2 o 3 Powder, where 0.003≤x≤0.145, 0.003≤y≤0.066.
[0023] In this step, preferably, x is 0.015, and y is 0.016.
[0024] It can be understood that ZnO, WO can also be weighed in this step 3 , MnO 2 and Cr 2 o 3 Powder and mixed evenly, the mass percentage of ZnO is 25%~35%, MnO 2 The mass percentage content is 0.1% to 5%, Cr 2 o 3 The mass percentage content is 0.1 ~ 2%, the balance is WO 3 . Preferably, the mass percentage of ZnO is 32%, MnO 2 The mass percentage content is 0.5%, Cr 2 o 3 The mass percentage content is 0.5%.
[0025] Step S12, sintering the mixed powder at 900°C-1300°C for 0.5-5 hours to obtain the target product.
[0026] In this step, it is preferable to sinter at ...
Embodiment 1
[0043] Select the powder with a purity of 99.99%, the ZnO with a mass percentage of 32%, the MnO with a mass percentage of 0.5% 2 , with a mass percentage of 0.5% Cr 2 o 3 and WO with a mass percentage of 67.45% 3 , after uniform mixing, sintering at 1250° C. for 3 hours to form a ceramic target with a diameter of 50 mm and a thickness of 2 mm, and the target was loaded into a vacuum chamber. Then, the glass substrate with indium tin oxide (ITO) was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, treated with oxygen plasma, and placed in a vacuum chamber. The distance between the target and the substrate is set to 60mm. Use a mechanical pump and a molecular pump to pump the vacuum of the cavity to 5.0×10 -4 Pa, the working gas flow rate of argon is 25 sccm, the pressure is adjusted to 2.0 Pa, and the substrate temperature is 500°C. The obtained samples were annealed in a 0.01 Pa vacuum furnace for 2 h at a temperature of 600 °C. Th...
Embodiment 2
[0048] Selecting the powder with a purity of 99.99%, the ZnO with a mass percentage of 25%, and the MnO with a mass percentage of 0.1% 2 , with a mass percentage of 2% Cr 2 o 3 and WO with a mass percentage of 72.99% 3 , after uniform mixing, sintering at 900°C for 5 hours to make a ceramic target with a diameter of 50mm and a thickness of 2mm, and put the target into a vacuum chamber. Then, the glass substrate with ITO was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, treated with oxygen plasma, and placed in a vacuum chamber. The distance between the target and the substrate was set to 45mm. Use a mechanical pump and a molecular pump to evacuate the vacuum of the chamber to 1.0×10 -3 Pa, the working gas flow rate of argon is 10 sccm, the pressure is adjusted to 0.2 Pa, and the substrate temperature is 250°C. The obtained samples were annealed in a 0.01 Pa vacuum furnace for 1 h at an annealing temperature of 500 °C. Then a laye...
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