Electrochromic device based on nano particles and preparation method thereof
A technology of electrochromic devices and nanoparticles, which is applied in the direction of instruments, nonlinear optics, optics, etc., can solve the problems of limiting the application of nanomaterials, complex and lengthy processes, and difficult control, etc., to achieve reliable processes, simple equipment, and few procedures. Effect
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preparation example Construction
[0041] The preparation method of the present invention is:
[0042] Step (1): preparing a first conductive electrode layer (b) on the first substrate layer (a), leading out electrode A, and then preparing an ion storage layer (c);
[0043] Step (2): preparing a second conductive electrode layer (f) on the second substrate layer (g), leading out electrode B, and then preparing an electrochromic layer (e);
[0044] Step (3): placing the ion-conducting layer (d) in the middle of the multilayer structure obtained in step (1) and step (2);
[0045] Step (4): Prepare an insulating encapsulation protective layer (h) around the device, so that the above-mentioned multi-layer structure is fixed to form a whole device.
[0046] For a solid ion-conducting layer, it can be coated on top of the ion storage layer or electrochromic layer in one of the previous steps, and then apply some pressure to align and bond the two parts, and seal it with an insulating encapsulating protective layer. ...
Embodiment example 1
[0059]Choose about 1 mm thick, high transparency, smooth surface, good mechanical strength glass substrate as the first substrate layer a or the second substrate layer g, after cleaning, prepare the ITO transparent first conductive electrode layer b by magnetron sputtering process and the second conductive electrode layer f, preferably with a thickness of 50-100 nm. Firstly, lead electrode A and electrode B on the first conductive electrode layer b and the second conductive electrode layer f respectively, and then take out one of them, and prepare the electrochromic layer e by using the method described above in this application. The nanoparticle material selected here is tetrahedral crystal tungsten trioxide nanoparticles with an average particle size of 90nm. The film thickness of the prepared electrochromic layer e is controlled at about 500nm. Anneal for two hours. Another piece of substrate (i.e. the other one of the above-mentioned first substrate layer or the second su...
Embodiment example 2
[0061] Similarly, a glass substrate with a thickness of about 1 mm, high transparency, flat surface, and good mechanical strength is selected as the first substrate layer a or the second substrate layer g, and the ITO transparent first conductive substrate is prepared by magnetron sputtering after cleaning. The thickness of the electrode layer b and the second conductive electrode layer f is preferably 50 nm. Firstly, lead electrode A and electrode B on the first conductive electrode layer b and the second conductive electrode layer f respectively, and then take out one of them, and prepare the electrochromic layer e by using the method described above in this application. The nanoparticle material selected here (preferably tetrahedral crystal tungsten trioxide nanoparticles with an average particle size of 60nm), the film thickness of the prepared electrochromic layer d is controlled at about 500nm, and the film of the electrochromic layer is controlled at 400°C. Two hours of...
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