Triple-junction solar cell and preparation method thereof
A solar cell and three-junction technology, which is applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of triple-junction battery current mismatch, poor uniformity of quantum dots in the active area, and poor spectral response, so as to reduce carriers Recombination, high conversion efficiency, and improved minority carrier lifetime
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[0032] The present invention will be further described below in conjunction with the examples, but the protection scope of the present invention should not be limited thereby.
[0033] Such as figure 1 As shown, a triple-junction solar cell includes: Ge bottom cell 100, In 0.01 Ga 0.99 Cells in As and Ga 0.5 In 0.5 The P top cell 500 and each junction cell are connected through tunnel junctions 500 and 510 .
[0034] The Ge bottom cell 100 is formed by self-diffusion on a P-type Ge substrate. In MOCVD equipment, pre-pass PH 3 And growing the GaInP initial layer can make the P atoms diffuse into the Ge substrate to form an N-type Ge emission region, and the thickness of the emission region is about 0.1um.
[0035] GaInP 110 is grown on the Ge bottom cell 100 to overcome the lattice mismatch between the Ge substrate and the InGaAs material, and at the same time serve as a window layer for the Ge bottom cell.
[0036] grow In on the GaInP window layer 110 0.01 Ga 0.99 As...
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